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ACS Applied Materials & Interfaces|July 22, 2024
Layer-Ordered Organooxotin Clusters for Extreme-Ultraviolet PhotolithographySihyun Woo, Ji Hye Baek, Chawon Koh, et al.
ACS Materials Au|September 16, 2024
Multinuclear Tin-Based Macrocyclic Organometallic Resist for EUV PhotolithographyGayoung Lim, Kangsik Lee, Chawon Koh, et al.
Langmuir : the ACS Journal of Surfaces and Colloids|February 24, 2023
Extreme UV Resist Exhibiting Synergism between Chemical and Physical Crosslinking MechanismsYejin Ku, KangHyun Kim, Hyun-Taek Oh, et al.
ACS Omega|September 9, 2024
Solubility Change Behavior of Fluoroalkyl Ether-Tagged Dendritic Hexaphenol under Extreme UV ExposureHyun-Taek Oh, Gayoung Kim, Seok-Heon Jung, et al.
Scientific Reports|December 9, 2025
Unraveling the relative impact of material and optical stochastic effects on EUV LWRJi Young Park, Yongbeom Seo, Dong-Hun Shin, et al.
Organic Letters|January 20, 2026
Synergistic Fluoroalkyl and Electron-Rich Vinyl Units for Ionizing Radiation-Induced Cross-LinkingGayoung Kim, Yejin Ku, Sung-Wook Hwang, et al.
RSC Advances|April 15, 2022
Perfluoroalkylated alternating copolymer possessing solubility in fluorous liquids and imaging capabilities under high energy radiationHyun-Taek Oh, Seok-Heon Jung, Kang-Hyun Kim, et al.
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