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Christopher J Ellison

Showing results (71-80 of 84) with videos related to

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ACS Applied Materials & Interfaces|February 5, 2020
Multiblock Copolymers for Recycling Polyethylene-Poly(ethylene terephthalate) Mixed WasteKeiichiro Nomura, Xiayu Peng, Hanim Kim, et al.
ACS Applied Materials & Interfaces|November 23, 2019
Strategies for Increasing the Rate of Defect Annihilation in the Directed Self-Assembly of High-χ Block CopolymersJan Doise, Jai Hyun Koh, Ji Yeon Kim, et al.
ACS Applied Materials & Interfaces|September 29, 2022
Camphene-Assisted Fabrication of Free-Standing Lithium-Ion Battery Electrode CompositesJason A Weeks, Samantha Lauro, James N Burrow, et al.
Macromolecules|May 1, 2018
Characterizing the Interface Scaling of High <i>χ</i> Block Copolymers near the Order-Disorder TransitionDaniel F Sunday, Michael J Maher, Adam F Hannon, et al.
Langmuir : the ACS Journal of Surfaces and Colloids|January 11, 2011
Polymeric cross-linked surface treatments for controlling block copolymer orientation in thin filmsChristopher M Bates, Jeffrey R Strahan, Logan J Santos, et al.
ACS Applied Materials & Interfaces|June 22, 2017
Reduced-Graphene Oxide/Poly(acrylic acid) Aerogels as a Three-Dimensional Replacement for Metal-Foil Current Collectors in Lithium-Ion BatteriesHan Xiao, Joshua P Pender, Mackenzie A Meece-Rayle, et al.
ACS Macro Letters|May 20, 2022
Photopatternable Interfaces for Block Copolymer LithographyMichael J Maher, Christopher M Bates, Gregory Blachut, et al.
ACS Applied Materials & Interfaces|January 17, 2015
Directed self-assembly of silicon-containing block copolymer thin filmsMichael J Maher, Charles T Rettner, Christopher M Bates, et al.
ACS Nano|March 30, 2012
Oligosaccharide/silicon-containing block copolymers with 5 nm features for lithographic applicationsJulia D Cushen, Issei Otsuka, Christopher M Bates, et al.
ACS Macro Letters|May 26, 2022
Pattern Transfer of Sub-10 nm Features via Tin-Containing Block CopolymersMichael J Maher, Kazunori Mori, Stephen M Sirard, et al.
Pageof 9

Showing results (71-80 of 84) with videos related to

Sort By:
Pageof 9
ACS Applied Materials & Interfaces|February 5, 2020
Multiblock Copolymers for Recycling Polyethylene-Poly(ethylene terephthalate) Mixed WasteKeiichiro Nomura, Xiayu Peng, Hanim Kim, et al.
ACS Applied Materials & Interfaces|November 23, 2019
Strategies for Increasing the Rate of Defect Annihilation in the Directed Self-Assembly of High-χ Block CopolymersJan Doise, Jai Hyun Koh, Ji Yeon Kim, et al.
ACS Applied Materials & Interfaces|September 29, 2022
Camphene-Assisted Fabrication of Free-Standing Lithium-Ion Battery Electrode CompositesJason A Weeks, Samantha Lauro, James N Burrow, et al.
Macromolecules|May 1, 2018
Characterizing the Interface Scaling of High <i>χ</i> Block Copolymers near the Order-Disorder TransitionDaniel F Sunday, Michael J Maher, Adam F Hannon, et al.
Langmuir : the ACS Journal of Surfaces and Colloids|January 11, 2011
Polymeric cross-linked surface treatments for controlling block copolymer orientation in thin filmsChristopher M Bates, Jeffrey R Strahan, Logan J Santos, et al.
ACS Applied Materials & Interfaces|June 22, 2017
Reduced-Graphene Oxide/Poly(acrylic acid) Aerogels as a Three-Dimensional Replacement for Metal-Foil Current Collectors in Lithium-Ion BatteriesHan Xiao, Joshua P Pender, Mackenzie A Meece-Rayle, et al.
ACS Macro Letters|May 20, 2022
Photopatternable Interfaces for Block Copolymer LithographyMichael J Maher, Christopher M Bates, Gregory Blachut, et al.
ACS Applied Materials & Interfaces|January 17, 2015
Directed self-assembly of silicon-containing block copolymer thin filmsMichael J Maher, Charles T Rettner, Christopher M Bates, et al.
ACS Nano|March 30, 2012
Oligosaccharide/silicon-containing block copolymers with 5 nm features for lithographic applicationsJulia D Cushen, Issei Otsuka, Christopher M Bates, et al.
ACS Macro Letters|May 26, 2022
Pattern Transfer of Sub-10 nm Features via Tin-Containing Block CopolymersMichael J Maher, Kazunori Mori, Stephen M Sirard, et al.
Pageof 9