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Christos Messinis

Showing results (1-10 of 4) with videos related to

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Applied Optics|May 14, 2020
Impact of coherence length on the field of view in dark-field holographic microscopy for semiconductor metrology: theoretical and experimental comparisonsChristos Messinis, Vasco T Tenner, Johannes F De Boer, et al.
Optics Express|January 6, 2023
Field-position dependent apodization in dark-field digital holographic microscopy for semiconductor metrologyTamar van Gardingen-Cromwijk, Manashee Adhikary, Christos Messinis, et al.
Optics Express|December 31, 2020
Diffraction-based overlay metrology using angular-multiplexed acquisition of dark-field digital hologramsChristos Messinis, Theodorus T M van Schaijk, Nitesh Pandey, et al.
Optics Express|November 23, 2021
Aberration calibration and correction with nano-scatterers in digital holographic microscopy for semiconductor metrologyChristos Messinis, Theodorus T M van Schaijk, Nitesh Pandey, et al.
Pageof 1

Showing results (1-10 of 4) with videos related to

Sort By:
Pageof 1
Applied Optics|May 14, 2020
Impact of coherence length on the field of view in dark-field holographic microscopy for semiconductor metrology: theoretical and experimental comparisonsChristos Messinis, Vasco T Tenner, Johannes F De Boer, et al.
Optics Express|January 6, 2023
Field-position dependent apodization in dark-field digital holographic microscopy for semiconductor metrologyTamar van Gardingen-Cromwijk, Manashee Adhikary, Christos Messinis, et al.
Optics Express|December 31, 2020
Diffraction-based overlay metrology using angular-multiplexed acquisition of dark-field digital hologramsChristos Messinis, Theodorus T M van Schaijk, Nitesh Pandey, et al.
Optics Express|November 23, 2021
Aberration calibration and correction with nano-scatterers in digital holographic microscopy for semiconductor metrologyChristos Messinis, Theodorus T M van Schaijk, Nitesh Pandey, et al.
Pageof 1