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Applied Optics|July 21, 2015
Robust hybrid source and mask optimization to lithography source blur and flareChunying Han, Yanqiu Li, Xu Ma, et al.Applied Optics|October 17, 2014
Inverse pupil wavefront optimization for immersion lithographyChunying Han, Yanqiu Li, Lisong Dong, et al.Journal of the Optical Society of America. A, Optics, Image Science, and Vision|March 5, 2013
Pixelated source and mask optimization for immersion lithographyXu Ma, Chunying Han, Yanqiu Li, et al.Applied Optics|July 12, 2013
Hybrid source mask optimization for robust immersion lithographyXu Ma, Chunying Han, Yanqiu Li, et al.Applied Optics|October 18, 2022
Inverse lithography source and mask optimization via Bayesian compressive sensingYiyu Sun, Yanqiu Li, Lihui LiuApplied Optics|February 24, 2022
Grouping design method dependence on an illumination system and large off-axis distance for an anamorphic extreme ultraviolet lithography objectiveXu Yan, Yanqiu Li, Lihui Liu, et al.Optics Express|January 29, 2025
Design of a high transmission illumination optics for anamorphic EUV lithography optics using deep reinforcement learningTong Li, Yuqing Chen, Yanqiu Li, et al.Applied Optics|October 18, 2022
Design of an objective for a hyper-numerical-aperture immersion lithography tool with a multi-step alternative grouping design methodXu Yan, Yanqiu Li, Lihui Liu, et al.Applied Optics|August 12, 2025
Design of a grazing incidence illumination system for anamorphic extreme ultraviolet lithographyYuqing Chen, Tong Li, Yanqiu Li, et al.Applied Optics|October 18, 2022
Design of an extreme ultraviolet lithography projection objective with a grouping design method through forward and reverse real ray tracingXu Yan, Yanqiu Li, Yuanhe Li, et al.Pageof 151