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David Wei Zhang

Showing results (1-10 of 193) with videos related to

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Micromachines|March 28, 2026
Research on Multi-Frequency Vibration Dynamic Compensation Scheme for Electron Beam Inspection EquipmentJunhai Jiang, David Wei Zhang, Ziyu Liu
Nanomaterials (Basel, Switzerland)|January 9, 2026
Remote Plasma Selective Silicon Etching Enabled Tunable Sub-Fin Process for Improved Parasitic Bottom Channel Control in Gate-All-Around Nanosheet Field-Effect TransistorsJiayang Li, Yuan Gao, David Wei Zhang
Materials (Basel, Switzerland)|May 7, 2025
A Copper-Molybdenum Etchant with Wide Process Window, Long Bath Life and High Stability for Thin Film Transistor Liquid Crystal Display ApplicationsBing Zhang, Yafen Yang, David Wei Zhang
Science Bulletin|January 20, 2023
Two-dimensional materials for synaptic electronics and neuromorphic systemsShuiyuan Wang, David Wei Zhang, Peng Zhou
Micromachines|April 26, 2025
A High-Density 4H-SiC MOSFET Based on a Buried Field Limiting Ring with Low Q<sub>gd</sub> and R<sub>on</sub>Wenrong Cui, Jianbin Guo, Hang Xu, et al.
The Journal of Physical Chemistry. A|July 4, 2009
Density functional theory study on the reaction mechanisms of bis(cyclopentadienyl)magnesium with hydrogenated and hydroxylated Si(100)-(2x1) surfacesHong-Liang Lu, Shi-Jin Ding, David Wei Zhang
Micromachines|March 28, 2026
MM-WAE: Multimodal Wasserstein Autoencoders for Semi-Supervised Wafer Map Defect RecognitionYifeng Zhang, Qingqing Sun, Ziyu Liu, et al.
Nanoscale|March 10, 2022
Self-limiting nitrogen/hydrogen plasma radical chemistry in plasma-enhanced atomic layer deposition of cobaltJi Liu, Hongliang Lu, David Wei Zhang, et al.
Nanomaterials (Basel, Switzerland)|October 15, 2025
Highly Selective Isotropic Etching of Si to SiGe Using CF<sub>4</sub>/O<sub>2</sub>/N<sub>2</sub> Plasma for Advanced GAA Nanosheet TransistorJiayang Li, Xin Sun, Ziqiang Huang, et al.
The Journal of Physical Chemistry. C, Nanomaterials and Interfaces|July 26, 2023
Nucleation of Co and Ru Precursors on Silicon with Different Surface Terminations: Impact on Nucleation DelayJi Liu, Rita Mullins, Hongliang Lu, et al.
Pageof 20

Showing results (1-10 of 193) with videos related to

Sort By:
Pageof 20
Micromachines|March 28, 2026
Research on Multi-Frequency Vibration Dynamic Compensation Scheme for Electron Beam Inspection EquipmentJunhai Jiang, David Wei Zhang, Ziyu Liu
Nanomaterials (Basel, Switzerland)|January 9, 2026
Remote Plasma Selective Silicon Etching Enabled Tunable Sub-Fin Process for Improved Parasitic Bottom Channel Control in Gate-All-Around Nanosheet Field-Effect TransistorsJiayang Li, Yuan Gao, David Wei Zhang
Materials (Basel, Switzerland)|May 7, 2025
A Copper-Molybdenum Etchant with Wide Process Window, Long Bath Life and High Stability for Thin Film Transistor Liquid Crystal Display ApplicationsBing Zhang, Yafen Yang, David Wei Zhang
Science Bulletin|January 20, 2023
Two-dimensional materials for synaptic electronics and neuromorphic systemsShuiyuan Wang, David Wei Zhang, Peng Zhou
Micromachines|April 26, 2025
A High-Density 4H-SiC MOSFET Based on a Buried Field Limiting Ring with Low Q<sub>gd</sub> and R<sub>on</sub>Wenrong Cui, Jianbin Guo, Hang Xu, et al.
The Journal of Physical Chemistry. A|July 4, 2009
Density functional theory study on the reaction mechanisms of bis(cyclopentadienyl)magnesium with hydrogenated and hydroxylated Si(100)-(2x1) surfacesHong-Liang Lu, Shi-Jin Ding, David Wei Zhang
Micromachines|March 28, 2026
MM-WAE: Multimodal Wasserstein Autoencoders for Semi-Supervised Wafer Map Defect RecognitionYifeng Zhang, Qingqing Sun, Ziyu Liu, et al.
Nanoscale|March 10, 2022
Self-limiting nitrogen/hydrogen plasma radical chemistry in plasma-enhanced atomic layer deposition of cobaltJi Liu, Hongliang Lu, David Wei Zhang, et al.
Nanomaterials (Basel, Switzerland)|October 15, 2025
Highly Selective Isotropic Etching of Si to SiGe Using CF<sub>4</sub>/O<sub>2</sub>/N<sub>2</sub> Plasma for Advanced GAA Nanosheet TransistorJiayang Li, Xin Sun, Ziqiang Huang, et al.
The Journal of Physical Chemistry. C, Nanomaterials and Interfaces|July 26, 2023
Nucleation of Co and Ru Precursors on Silicon with Different Surface Terminations: Impact on Nucleation DelayJi Liu, Rita Mullins, Hongliang Lu, et al.
Pageof 20