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David Zanders

Showing results (11-20 of 22) with videos related to

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ACS Applied Materials & Interfaces|July 25, 2019
PEALD of HfO<sub>2</sub> Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive GasesDavid Zanders, Engin Ciftyurek, Ersoy Subaşı, et al.
ACS Applied Materials & Interfaces|March 2, 2022
Bendable Polycrystalline and Magnetic CoFe<sub>2</sub>O<sub>4</sub> Membranes by Chemical MethodsPol Salles, Roger Guzmán, David Zanders, et al.
Dalton Transactions (Cambridge, England : 2003)|November 12, 2025
Plasma-enhanced atomic layer deposition of AlPO<sub>4</sub>/AlP<sub><i>x</i></sub>O<sub><i>y</i></sub>: comparing dual source and supercycle approaches for composition controlFlorian Preischel, David Zanders, Jean-Pierre Glauber, et al.
Inorganic Chemistry|August 7, 2021
Synthesis, Characterization, and Thermal Study of Divalent Germanium, Tin, and Lead Triazenides as Potential Vapor Deposition PrecursorsRouzbeh Samii, David Zanders, Anton Fransson, et al.
Small (Weinheim an Der Bergstrasse, Germany)|May 1, 2023
Direct-Patterning ZnO Deposition by Atomic-Layer Additive Manufacturing Using a Safe and Economical PrecursorSonja Stefanovic, Negar Gheshlaghi, David Zanders, et al.
Dalton Transactions (Cambridge, England : 2003)|September 28, 2021
A study on the influence of ligand variation on formamidinate complexes of yttrium: new precursors for atomic layer deposition of yttrium oxideSebastian M J Beer, Nils Boysen, Arbresha Muriqi, et al.
Chemistry (Weinheim an Der Bergstrasse, Germany)|March 15, 2019
Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium OxideLukas Mai, Nils Boysen, David Zanders, et al.
Dalton Transactions (Cambridge, England : 2003)|September 23, 2020
A new metalorganic chemical vapor deposition process for MoS<sub>2</sub> with a 1,4-diazabutadienyl stabilized molybdenum precursor and elemental sulfurJan-Lucas Wree, Engin Ciftyurek, David Zanders, et al.
Dalton Transactions (Cambridge, England : 2003)|March 7, 2024
Synthesis, characterisation and reactivity of a zinc triazenide for potential use in vapour depositionRouzbeh Samii, Essi Barkas, David Zanders, et al.
Chemistry (Weinheim an Der Bergstrasse, Germany)|January 20, 2021
Rational Development of Guanidinate and Amidinate Based Cerium and Ytterbium Complexes as Atomic Layer Deposition Precursors: Synthesis, Modeling, and ApplicationParmish Kaur, Lukas Mai, Arbresha Muriqi, et al.
Pageof 3

Showing results (11-20 of 22) with videos related to

Sort By:
Pageof 3
ACS Applied Materials & Interfaces|July 25, 2019
PEALD of HfO<sub>2</sub> Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive GasesDavid Zanders, Engin Ciftyurek, Ersoy Subaşı, et al.
ACS Applied Materials & Interfaces|March 2, 2022
Bendable Polycrystalline and Magnetic CoFe<sub>2</sub>O<sub>4</sub> Membranes by Chemical MethodsPol Salles, Roger Guzmán, David Zanders, et al.
Dalton Transactions (Cambridge, England : 2003)|November 12, 2025
Plasma-enhanced atomic layer deposition of AlPO<sub>4</sub>/AlP<sub><i>x</i></sub>O<sub><i>y</i></sub>: comparing dual source and supercycle approaches for composition controlFlorian Preischel, David Zanders, Jean-Pierre Glauber, et al.
Inorganic Chemistry|August 7, 2021
Synthesis, Characterization, and Thermal Study of Divalent Germanium, Tin, and Lead Triazenides as Potential Vapor Deposition PrecursorsRouzbeh Samii, David Zanders, Anton Fransson, et al.
Small (Weinheim an Der Bergstrasse, Germany)|May 1, 2023
Direct-Patterning ZnO Deposition by Atomic-Layer Additive Manufacturing Using a Safe and Economical PrecursorSonja Stefanovic, Negar Gheshlaghi, David Zanders, et al.
Dalton Transactions (Cambridge, England : 2003)|September 28, 2021
A study on the influence of ligand variation on formamidinate complexes of yttrium: new precursors for atomic layer deposition of yttrium oxideSebastian M J Beer, Nils Boysen, Arbresha Muriqi, et al.
Chemistry (Weinheim an Der Bergstrasse, Germany)|March 15, 2019
Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium OxideLukas Mai, Nils Boysen, David Zanders, et al.
Dalton Transactions (Cambridge, England : 2003)|September 23, 2020
A new metalorganic chemical vapor deposition process for MoS<sub>2</sub> with a 1,4-diazabutadienyl stabilized molybdenum precursor and elemental sulfurJan-Lucas Wree, Engin Ciftyurek, David Zanders, et al.
Dalton Transactions (Cambridge, England : 2003)|March 7, 2024
Synthesis, characterisation and reactivity of a zinc triazenide for potential use in vapour depositionRouzbeh Samii, Essi Barkas, David Zanders, et al.
Chemistry (Weinheim an Der Bergstrasse, Germany)|January 20, 2021
Rational Development of Guanidinate and Amidinate Based Cerium and Ytterbium Complexes as Atomic Layer Deposition Precursors: Synthesis, Modeling, and ApplicationParmish Kaur, Lukas Mai, Arbresha Muriqi, et al.
Pageof 3