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ACS Applied Materials & Interfaces|May 12, 2018
A Three-Step Atomic Layer Deposition Process for SiN <sub>x</sub> Using Si<sub>2</sub>Cl<sub>6</sub>, CH<sub>3</sub>NH<sub>2</sub>, and N<sub>2</sub> PlasmaRafaiel A Ovanesyan, Dennis M Hausmann, Sumit AgarwalACS Applied Materials & Interfaces|May 1, 2015
Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si₂Cl₆ and NH₃ PlasmaRafaiel A Ovanesyan, Dennis M Hausmann, Sumit AgarwalChemical Communications (Cambridge, England)|May 20, 2022
Extending growth inhibition during area-selective atomic layer deposition of Al<sub>2</sub>O<sub>3</sub> on aminosilane-functionalized SiO<sub>2</sub>Wanxing Xu, Paul C Lemaire, Kashish Sharma, et al.Langmuir : the ACS Journal of Surfaces and Colloids|October 31, 2018
Gas Phase Organic Functionalization of SiO<sub>2</sub> with Propanoyl ChlorideRyan J Gasvoda, Scott Wang, Dennis M Hausmann, et al.Langmuir : the ACS Journal of Surfaces and Colloids|September 22, 2021
Characterizing Self-Assembled Monolayer Breakdown in Area-Selective Atomic Layer DepositionTzu-Ling Liu, Li Zeng, Katie L Nardi, et al.ACS Applied Materials & Interfaces|August 19, 2020
Effect of Multilayer versus Monolayer Dodecanethiol on Selectivity and Pattern Integrity in Area-Selective Atomic Layer DepositionTzu-Ling Liu, Katie L Nardi, Nerissa Draeger, et al.Langmuir : the ACS Journal of Surfaces and Colloids|January 6, 2022
Functionalization of the SiO<sub>2</sub> Surface with Aminosilanes to Enable Area-Selective Atomic Layer Deposition of Al<sub>2</sub>O<sub>3</sub>Wanxing Xu, Mitchel G N Haeve, Paul C Lemaire, et al.ACS Applied Materials & Interfaces|January 7, 2017
Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N<sub>2</sub> Plasma on Planar and 3D Substrate TopographiesTahsin Faraz, Maarten van Drunen, Harm C M Knoops, et al.The Journal of Physical Chemistry. C, Nanomaterials and Interfaces|March 25, 2022
Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule InhibitorsMarc J M Merkx, Athanasios Angelidis, Alfredo Mameli, et al.ACS Applied Materials & Interfaces|March 21, 2018
Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate TopographiesTahsin Faraz, Harm C M Knoops, Marcel A Verheijen, et al.Pageof 1