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Dipu Borah

Showing results (1-10 of 18) with videos related to

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Journal of Colloid and Interface Science|December 18, 2007
Surface-modified carbon black for As(V) removalDipu Borah, Shigeo Satokawa, Shigeru Kato, et al.
Journal of Hazardous Materials|July 26, 2008
Sorption of As(V) from aqueous solution using acid modified carbon blackDipu Borah, Shigeo Satokawa, Shigeru Kato, et al.
ACS Applied Materials & Interfaces|February 21, 2013
Sub-10 nm feature size PS-b-PDMS block copolymer structures fabricated by a microwave-assisted solvothermal processDipu Borah, Matthew T Shaw, Justin D Holmes, et al.
Langmuir : the ACS Journal of Surfaces and Colloids|June 12, 2013
Tuning PDMS brush chemistry by UV-O3 exposure for PS-b-PDMS microphase separation and directed self-assemblyDipu Borah, Sozaraj Rasappa, Ramsankar Senthamaraikannan, et al.
Analytical Chemistry|December 12, 2017
Electrochemical Sensing of Hydrogen Peroxide Using Block Copolymer Templated Iron Oxide NanopatternsSalih Z Bas, Cian Cummins, Dipu Borah, et al.
Scientific Reports|August 21, 2015
A Highly Efficient Sensor Platform Using Simply Manufactured Nanodot Patterned SubstratesSozaraj Rasappa, Tandra Ghoshal, Dipu Borah, et al.
International Journal of Molecular Sciences|October 30, 2009
Chemical interactions and their role in the microphase separation of block copolymer thin filmsRichard A Farrell, Thomas G Fitzgerald, Dipu Borah, et al.
ACS Nano|July 18, 2013
Swift nanopattern formation of PS-b-PMMA and PS-b-PDMS block copolymer films using a microwave assisted techniqueDipu Borah, Ramsankar Senthamaraikannan, Sozaraj Rasappa, et al.
Langmuir : the ACS Journal of Surfaces and Colloids|February 1, 2013
Molecularly functionalized silicon substrates for orientation control of the microphase separation of PS-b-PMMA and PS-b-PDMS block copolymer systemsDipu Borah, Mustafa Ozmen, Sozaraj Rasappa, et al.
Journal of Colloid and Interface Science|December 11, 2012
The sensitivity of random polymer brush-lamellar polystyrene-b-polymethylmethacrylate block copolymer systems to process conditionsDipu Borah, Sozaraj Rasappa, Ramsankar Senthamaraikannan, et al.
Pageof 2

Showing results (1-10 of 18) with videos related to

Sort By:
Pageof 2
Journal of Colloid and Interface Science|December 18, 2007
Surface-modified carbon black for As(V) removalDipu Borah, Shigeo Satokawa, Shigeru Kato, et al.
Journal of Hazardous Materials|July 26, 2008
Sorption of As(V) from aqueous solution using acid modified carbon blackDipu Borah, Shigeo Satokawa, Shigeru Kato, et al.
ACS Applied Materials & Interfaces|February 21, 2013
Sub-10 nm feature size PS-b-PDMS block copolymer structures fabricated by a microwave-assisted solvothermal processDipu Borah, Matthew T Shaw, Justin D Holmes, et al.
Langmuir : the ACS Journal of Surfaces and Colloids|June 12, 2013
Tuning PDMS brush chemistry by UV-O3 exposure for PS-b-PDMS microphase separation and directed self-assemblyDipu Borah, Sozaraj Rasappa, Ramsankar Senthamaraikannan, et al.
Analytical Chemistry|December 12, 2017
Electrochemical Sensing of Hydrogen Peroxide Using Block Copolymer Templated Iron Oxide NanopatternsSalih Z Bas, Cian Cummins, Dipu Borah, et al.
Scientific Reports|August 21, 2015
A Highly Efficient Sensor Platform Using Simply Manufactured Nanodot Patterned SubstratesSozaraj Rasappa, Tandra Ghoshal, Dipu Borah, et al.
International Journal of Molecular Sciences|October 30, 2009
Chemical interactions and their role in the microphase separation of block copolymer thin filmsRichard A Farrell, Thomas G Fitzgerald, Dipu Borah, et al.
ACS Nano|July 18, 2013
Swift nanopattern formation of PS-b-PMMA and PS-b-PDMS block copolymer films using a microwave assisted techniqueDipu Borah, Ramsankar Senthamaraikannan, Sozaraj Rasappa, et al.
Langmuir : the ACS Journal of Surfaces and Colloids|February 1, 2013
Molecularly functionalized silicon substrates for orientation control of the microphase separation of PS-b-PMMA and PS-b-PDMS block copolymer systemsDipu Borah, Mustafa Ozmen, Sozaraj Rasappa, et al.
Journal of Colloid and Interface Science|December 11, 2012
The sensitivity of random polymer brush-lamellar polystyrene-b-polymethylmethacrylate block copolymer systems to process conditionsDipu Borah, Sozaraj Rasappa, Ramsankar Senthamaraikannan, et al.
Pageof 2