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Gregg M Gallatin

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Nanoscale|April 14, 2011
Lithography, metrology and nanomanufacturingJ Alexander Liddle, Gregg M Gallatin
ACS Nano|February 11, 2016
Nanomanufacturing: A PerspectiveJ Alexander Liddle, Gregg M Gallatin
Applied Optics|June 21, 2003
Line-edge roughness transfer function and its application to determining mask effects in EUV resist characterizationPatrick P Naulleau, Gregg M Gallatin
Chemical Communications (Cambridge, England)|December 19, 2012
Quantum dot-DNA origami binding: a single particle, 3D, real-time tracking studyKan Du, Seung Hyeon Ko, Gregg M Gallatin, et al.
Pageof 1

Showing results (1-10 of 4) with videos related to

Sort By:
Pageof 1
Nanoscale|April 14, 2011
Lithography, metrology and nanomanufacturingJ Alexander Liddle, Gregg M Gallatin
ACS Nano|February 11, 2016
Nanomanufacturing: A PerspectiveJ Alexander Liddle, Gregg M Gallatin
Applied Optics|June 21, 2003
Line-edge roughness transfer function and its application to determining mask effects in EUV resist characterizationPatrick P Naulleau, Gregg M Gallatin
Chemical Communications (Cambridge, England)|December 19, 2012
Quantum dot-DNA origami binding: a single particle, 3D, real-time tracking studyKan Du, Seung Hyeon Ko, Gregg M Gallatin, et al.
Pageof 1