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Gregory Blachut

Showing results (1-10 of 10) with videos related to

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Physical Review. E|January 20, 2018
Influence of topographically patterned angled guidelines on directed self-assembly of block copolymersNathan Rebello, Vaidyanathan Sethuraman, Gregory Blachut, et al.
ACS Applied Materials & Interfaces|May 26, 2015
Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS-b-PMOSTJulia Cushen, Lei Wan, Gregory Blachut, et al.
ACS Nano|November 2, 2016
Structure, Stability, and Reorganization of 0.5 L<sub>0</sub> Topography in Block Copolymer Thin FilmsMichael J Maher, Jeffrey L Self, Pawel Stasiak, et al.
ACS Nano|July 13, 2017
Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer LamellaeAustin P Lane, XiaoMin Yang, Michael J Maher, et al.
Science (New York, N.Y.)|November 10, 2012
Polarity-switching top coats enable orientation of sub-10-nm block copolymer domainsChristopher M Bates, Takehiro Seshimo, Michael J Maher, et al.
Macromolecules|May 1, 2018
Characterizing the Interface Scaling of High <i>χ</i> Block Copolymers near the Order-Disorder TransitionDaniel F Sunday, Michael J Maher, Adam F Hannon, et al.
ACS Macro Letters|May 20, 2022
Photopatternable Interfaces for Block Copolymer LithographyMichael J Maher, Christopher M Bates, Gregory Blachut, et al.
ACS Applied Materials & Interfaces|January 17, 2015
Directed self-assembly of silicon-containing block copolymer thin filmsMichael J Maher, Charles T Rettner, Christopher M Bates, et al.
ACS Macro Letters|May 26, 2022
Pattern Transfer of Sub-10 nm Features via Tin-Containing Block CopolymersMichael J Maher, Kazunori Mori, Stephen M Sirard, et al.
ACS Applied Materials & Interfaces|April 30, 2020
Spatial Control of the Self-assembled Block Copolymer Domain Orientation and Alignment on Photopatterned SurfacesJi Yeon Kim, Philip Liu, Michael J Maher, et al.
Pageof 1

Showing results (1-10 of 10) with videos related to

Sort By:
Pageof 1
Physical Review. E|January 20, 2018
Influence of topographically patterned angled guidelines on directed self-assembly of block copolymersNathan Rebello, Vaidyanathan Sethuraman, Gregory Blachut, et al.
ACS Applied Materials & Interfaces|May 26, 2015
Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS-b-PMOSTJulia Cushen, Lei Wan, Gregory Blachut, et al.
ACS Nano|November 2, 2016
Structure, Stability, and Reorganization of 0.5 L<sub>0</sub> Topography in Block Copolymer Thin FilmsMichael J Maher, Jeffrey L Self, Pawel Stasiak, et al.
ACS Nano|July 13, 2017
Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer LamellaeAustin P Lane, XiaoMin Yang, Michael J Maher, et al.
Science (New York, N.Y.)|November 10, 2012
Polarity-switching top coats enable orientation of sub-10-nm block copolymer domainsChristopher M Bates, Takehiro Seshimo, Michael J Maher, et al.
Macromolecules|May 1, 2018
Characterizing the Interface Scaling of High <i>χ</i> Block Copolymers near the Order-Disorder TransitionDaniel F Sunday, Michael J Maher, Adam F Hannon, et al.
ACS Macro Letters|May 20, 2022
Photopatternable Interfaces for Block Copolymer LithographyMichael J Maher, Christopher M Bates, Gregory Blachut, et al.
ACS Applied Materials & Interfaces|January 17, 2015
Directed self-assembly of silicon-containing block copolymer thin filmsMichael J Maher, Charles T Rettner, Christopher M Bates, et al.
ACS Macro Letters|May 26, 2022
Pattern Transfer of Sub-10 nm Features via Tin-Containing Block CopolymersMichael J Maher, Kazunori Mori, Stephen M Sirard, et al.
ACS Applied Materials & Interfaces|April 30, 2020
Spatial Control of the Self-assembled Block Copolymer Domain Orientation and Alignment on Photopatterned SurfacesJi Yeon Kim, Philip Liu, Michael J Maher, et al.
Pageof 1