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Huwen Ding

Showing results (1-10 of 9) with videos related to

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Applied Optics|October 19, 2023
Aberration budget analysis of EUV lithography from the imaging performance of a contact layer in a 5  nm technology nodeZhishu Chen, Lisong Dong, Huwen Ding, et al.
Optics Express|July 30, 2025
Impact of mask errors on imaging quality in surface plasmon lithographyDinghai Rui, LiBin Zhang, Yayi Wei, et al.
Optics Express|November 29, 2023
Three-dimensional plasmonic lithography imaging modeling based on the RCWA algorithm for computational lithographyHuwen Ding, Taian Fan, Libin Zhang, et al.
Applied Optics|January 16, 2024
Mask correction method for surface plasmon lithographyLe Ma, Libin Zhang, Jianfang He, et al.
Optics Express|January 6, 2023
Plasmonic lithography fast imaging model based on the decomposition machine learning methodHuwen Ding, Lihong Liu, Ziqi Li, et al.
Optics Express|August 13, 2025
Super-resolution imaging using surface plasmon resonance cavity lithographyDinghai Rui, LiBin Zhang, Huwen Ding, et al.
Optics Express|May 4, 2026
Plasmonic lithography fast imaging model based on the decomposition machine learning method under arbitrary illumination systemZhenyu Xing, Huwen Ding, Yajuan Su, et al.
Optics Express|August 13, 2025
Robustness optimization of superlens imaging structures in surface plasmon lithographyPengyu Ren, Huwen Ding, Libin Zhang, et al.
Optics Express|October 15, 2022
Study on forbidden pitch in plasmonic lithography: taking 365 nm wavelength thin silver film-based superlens imaging lithography as an exampleHuwen Ding, Lihong Liu, Lisong Dong, et al.
Pageof 1

Showing results (1-10 of 9) with videos related to

Sort By:
Pageof 1
Applied Optics|October 19, 2023
Aberration budget analysis of EUV lithography from the imaging performance of a contact layer in a 5  nm technology nodeZhishu Chen, Lisong Dong, Huwen Ding, et al.
Optics Express|July 30, 2025
Impact of mask errors on imaging quality in surface plasmon lithographyDinghai Rui, LiBin Zhang, Yayi Wei, et al.
Optics Express|November 29, 2023
Three-dimensional plasmonic lithography imaging modeling based on the RCWA algorithm for computational lithographyHuwen Ding, Taian Fan, Libin Zhang, et al.
Applied Optics|January 16, 2024
Mask correction method for surface plasmon lithographyLe Ma, Libin Zhang, Jianfang He, et al.
Optics Express|January 6, 2023
Plasmonic lithography fast imaging model based on the decomposition machine learning methodHuwen Ding, Lihong Liu, Ziqi Li, et al.
Optics Express|August 13, 2025
Super-resolution imaging using surface plasmon resonance cavity lithographyDinghai Rui, LiBin Zhang, Huwen Ding, et al.
Optics Express|May 4, 2026
Plasmonic lithography fast imaging model based on the decomposition machine learning method under arbitrary illumination systemZhenyu Xing, Huwen Ding, Yajuan Su, et al.
Optics Express|August 13, 2025
Robustness optimization of superlens imaging structures in surface plasmon lithographyPengyu Ren, Huwen Ding, Libin Zhang, et al.
Optics Express|October 15, 2022
Study on forbidden pitch in plasmonic lithography: taking 365 nm wavelength thin silver film-based superlens imaging lithography as an exampleHuwen Ding, Lihong Liu, Lisong Dong, et al.
Pageof 1