Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Filters

I A Artioukov

Showing results (1-10 of 5) with videos related to

Pageof 1
Sort By:
Journal of X-Ray Science and Technology|March 6, 2012
Optimum collimator for proximity X-ray lithography - Theoretical analysisI A Artioukov, I V Kozhevnikov, N I Kozhevnikova
Journal of X-Ray Science and Technology|February 11, 2011
Effects of a near-surface transition layer on x-ray reflection and scatteringI A Artioukov, V E Asadchikov, I V Kozhevnikov
Optics Letters|December 15, 2007
Focusing of a tabletop soft-x-ray laser beam and laser ablationB R Benware, A Ozols, J J Rocca, et al.
Optics Letters|March 24, 2004
Damage to extreme-ultraviolet Sc/Si multilayer mirrors exposed to intense 46.9-nm laser pulsesM Grisham, G Vaschenko, C S Menoni, et al.
Optics Letters|September 1, 2005
Nanoimaging with a compact extreme-ultraviolet laserG Vaschenko, F Brizuela, C Brewer, et al.
Pageof 1

Showing results (1-10 of 5) with videos related to

Sort By:
Pageof 1
Journal of X-Ray Science and Technology|March 6, 2012
Optimum collimator for proximity X-ray lithography - Theoretical analysisI A Artioukov, I V Kozhevnikov, N I Kozhevnikova
Journal of X-Ray Science and Technology|February 11, 2011
Effects of a near-surface transition layer on x-ray reflection and scatteringI A Artioukov, V E Asadchikov, I V Kozhevnikov
Optics Letters|December 15, 2007
Focusing of a tabletop soft-x-ray laser beam and laser ablationB R Benware, A Ozols, J J Rocca, et al.
Optics Letters|March 24, 2004
Damage to extreme-ultraviolet Sc/Si multilayer mirrors exposed to intense 46.9-nm laser pulsesM Grisham, G Vaschenko, C S Menoni, et al.
Optics Letters|September 1, 2005
Nanoimaging with a compact extreme-ultraviolet laserG Vaschenko, F Brizuela, C Brewer, et al.
Pageof 1