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Iacopo Mochi

Showing results (1-10 of 8) with videos related to

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Journal of the Optical Society of America. A, Optics, Image Science, and Vision|January 22, 2015
Gradient descent algorithm applied to wavefront retrieval from through-focus images by an extreme ultraviolet microscope with partially coherent sourceKenji Yamazoe, Iacopo Mochi, Kenneth A Goldberg
Applied Optics|July 12, 2011
Optical modeling of Fresnel zoneplate microscopesPatrick P Naulleau, Iacopo Mochi, Kenneth A Goldberg
Nanoscale|August 12, 2024
Extreme ultraviolet lithography reaches 5 nm resolutionIason Giannopoulos, Iacopo Mochi, Michaela Vockenhuber, et al.
Ultramicroscopy|January 13, 2024
Recovery of spatial frequencies in coherent diffraction imaging in the presence of a central obscurationAtoosa Dejkameh, Ricarda Nebling, Uldis Locans, et al.
Optics Express|May 3, 2018
Beam drift and partial probe coherence effects in EUV reflective-mode coherent diffractive imagingPatrick Helfenstein, Rajendran Rajeev, Iacopo Mochi, et al.
Optics Express|August 13, 2025
Prior-primed deep neural network based EUV mask inspectionPaolo Ansuinelli, Suman Saha, Luis Felipe Barba Flores, et al.
Soft Matter|July 13, 2018
Nano-confinement of block copolymers in high accuracy topographical guiding patterns: modelling the emergence of defectivity due to incommensurabilitySteven Gottlieb, Dimitrios Kazazis, Iacopo Mochi, et al.
Optics Express|July 20, 2010
Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masksFernando Brizuela, Sergio Carbajo, Anne Sakdinawat, et al.
Pageof 1

Showing results (1-10 of 8) with videos related to

Sort By:
Pageof 1
Journal of the Optical Society of America. A, Optics, Image Science, and Vision|January 22, 2015
Gradient descent algorithm applied to wavefront retrieval from through-focus images by an extreme ultraviolet microscope with partially coherent sourceKenji Yamazoe, Iacopo Mochi, Kenneth A Goldberg
Applied Optics|July 12, 2011
Optical modeling of Fresnel zoneplate microscopesPatrick P Naulleau, Iacopo Mochi, Kenneth A Goldberg
Nanoscale|August 12, 2024
Extreme ultraviolet lithography reaches 5 nm resolutionIason Giannopoulos, Iacopo Mochi, Michaela Vockenhuber, et al.
Ultramicroscopy|January 13, 2024
Recovery of spatial frequencies in coherent diffraction imaging in the presence of a central obscurationAtoosa Dejkameh, Ricarda Nebling, Uldis Locans, et al.
Optics Express|May 3, 2018
Beam drift and partial probe coherence effects in EUV reflective-mode coherent diffractive imagingPatrick Helfenstein, Rajendran Rajeev, Iacopo Mochi, et al.
Optics Express|August 13, 2025
Prior-primed deep neural network based EUV mask inspectionPaolo Ansuinelli, Suman Saha, Luis Felipe Barba Flores, et al.
Soft Matter|July 13, 2018
Nano-confinement of block copolymers in high accuracy topographical guiding patterns: modelling the emergence of defectivity due to incommensurabilitySteven Gottlieb, Dimitrios Kazazis, Iacopo Mochi, et al.
Optics Express|July 20, 2010
Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masksFernando Brizuela, Sergio Carbajo, Anne Sakdinawat, et al.
Pageof 1