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Advanced Materials (Deerfield Beach, Fla.)|June 6, 2019
Modeling of Negative Capacitance in Ferroelectric Thin FilmsHyeon Woo Park, Jangho Roh, Yong Bin Lee, et al.Nanoscale Research Letters|April 9, 2020
A Comparative Study on the Ferroelectric Performances in Atomic Layer Deposited Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> Thin Films Using Tetrakis(ethylmethylamino) and Tetrakis(dimethylamino) PrecursorsBaek Su Kim, Seung Dam Hyun, Taehwan Moon, et al.Pageof 1