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Physical Chemistry Chemical Physics : PCCP|April 1, 2017
Chemical states of 3d transition metal impurities in a liquid lead-bismuth eutectic analyzed using first principles calculationsJeong-Hwan Han, Takuji OdaPhysical Chemistry Chemical Physics : PCCP|November 20, 2019
Chemical origin of differences in steel corrosion behaviors of s-electron and p-electron liquid metals by first-principles calculationJeong-Hwan Han, Takuji OdaThe Journal of Chemical Physics|April 16, 2018
Performance of exchange-correlation functionals in density functional theory calculations for liquid metal: A benchmark test for sodiumJeong-Hwan Han, Takuji OdaArchives of Pharmacal Research|July 30, 2014
Targeting components of epigenome by small moleculesJueng Soo You, Jeong Hwan HanNanoscale Research Letters|February 1, 2020
Effect of Ag Concentration Dispersed in HfOx Thin Films on Threshold SwitchingWon Hee Jeong, Jeong Hwan Han, Byung Joon ChoiACS Applied Materials & Interfaces|February 6, 2026
Atomic-Layer-Deposition of Sn-Incorporated MoO2 Films as an Interface Control Layer for High-Performances TiO2-Based DRAM CapacitorsJae Hyeon Lee, Bo Keun Park, Taek-Mo Chung, et al.ACS Applied Materials & Interfaces|October 15, 2024
Enhanced Oxidation Resistance and Interface Stability of Atomic-Layer-Deposited MoN Electrodes via TiN Passivation for DRAM Cell Capacitor ApplicationsWangu Kang, Ji Sang Ahn, Jae Hyeon Lee, et al.ACS Applied Materials & Interfaces|April 26, 2024
Growth of Atomic layer-deposited Monoclinic Molybdenum Dioxide Films Stabilized by Tin Oxide Doping for DRAM Capacitor Electrode ApplicationsJae Hyeon Lee, Wangu Kang, Jeong Eun Shin, et al.ACS Applied Materials & Interfaces|August 8, 2012
Impact of bimetal electrodes on dielectric properties of TiO2 and Al-doped TiO2 filmsSeong Keun Kim, Sora Han, Woojin Jeon, et al.Nanotechnology|August 27, 2010
A theoretical model for Schottky diodes for excluding the sneak current in cross bar array resistive memoryGun Hwan Kim, Kyung Min Kim, Jun Yeong Seok, et al.Pageof 3