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Jeremiah R Lowney

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Scanning|August 9, 2002
Two-dimensional simulation and modeling in scanning electron microscope imaging and metrology researchMichael T Postek, András E Vladár, Jeremiah R Lowney, et al.
Journal of Research of the National Institute of Standards and Technology|January 6, 2017
X-Ray Lithography Mask Metrology: Use of Transmitted Electrons in an SEM for Linewidth MeasurementMichael T Postek, Jeremiah R Lowney, Andras E Vladar, et al.
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Showing results (1-10 of 2) with videos related to

Sort By:
Pageof 1
Scanning|August 9, 2002
Two-dimensional simulation and modeling in scanning electron microscope imaging and metrology researchMichael T Postek, András E Vladár, Jeremiah R Lowney, et al.
Journal of Research of the National Institute of Standards and Technology|January 6, 2017
X-Ray Lithography Mask Metrology: Use of Transmitted Electrons in an SEM for Linewidth MeasurementMichael T Postek, Jeremiah R Lowney, Andras E Vladar, et al.
Pageof 1