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Justin E Poelma

Showing results (1-10 of 5) with videos related to

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ACS Nano|December 1, 2012
Cyclic block copolymers for controlling feature sizes in block copolymer lithographyJustin E Poelma, Kosuke Ono, Daigo Miyajima, et al.
Journal of the American Chemical Society|May 23, 2014
Photoswitching using visible light: a new class of organic photochromic moleculesSameh Helmy, Frank A Leibfarth, Saemi Oh, et al.
Journal of the American Chemical Society|September 13, 2013
Fabrication of unique chemical patterns and concentration gradients with visible lightBrett P Fors, Justin E Poelma, Matthew S Menyo, et al.
ACS Macro Letters|May 24, 2022
Strongly Phase-Segregating Block Copolymers with Sub-20 nm FeaturesKristian Kempe, Kato L Killops, Justin E Poelma, et al.
ACS Nano|July 14, 2011
Three-dimensional multilayered nanostructures with controlled orientation of microdomains from cross-linkable block copolymersHyunjung Jung, Dongjune Hwang, Eunhye Kim, et al.
Pageof 1

Showing results (1-10 of 5) with videos related to

Sort By:
Pageof 1
ACS Nano|December 1, 2012
Cyclic block copolymers for controlling feature sizes in block copolymer lithographyJustin E Poelma, Kosuke Ono, Daigo Miyajima, et al.
Journal of the American Chemical Society|May 23, 2014
Photoswitching using visible light: a new class of organic photochromic moleculesSameh Helmy, Frank A Leibfarth, Saemi Oh, et al.
Journal of the American Chemical Society|September 13, 2013
Fabrication of unique chemical patterns and concentration gradients with visible lightBrett P Fors, Justin E Poelma, Matthew S Menyo, et al.
ACS Macro Letters|May 24, 2022
Strongly Phase-Segregating Block Copolymers with Sub-20 nm FeaturesKristian Kempe, Kato L Killops, Justin E Poelma, et al.
ACS Nano|July 14, 2011
Three-dimensional multilayered nanostructures with controlled orientation of microdomains from cross-linkable block copolymersHyunjung Jung, Dongjune Hwang, Eunhye Kim, et al.
Pageof 1