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Sensors (Basel, Switzerland)|January 11, 2025
A Study on the Development of Real-Time Chamber Contamination Diagnosis SensorsJunyeob Lee, Kyongnam KimMaterials (Basel, Switzerland)|May 27, 2023
Atomic Layer Etching Using a Novel Radical Generation ModuleJunho Jung, Kyongnam KimNanotechnology|August 7, 2025
Development of a Cleaning Endpoint Evaluation Sensor to reliably monitor plasma chamber cleaningSuyoung Jang, Dohyeon Kim, Taehyung Kim, et al.Nanoscale|July 16, 2024
Clean SiO2 atomic layer etching based on physisorption of high boiling point perfluorocarbonDain Sung, Hyunwoo Tak, Heeju Kim, et al.Nanotechnology|August 17, 2016
Improvement of a block co-polymer (PS-b-PMMA)-masked silicon etch profile using a neutral beamDeokhyun Yun, Jinwoo Park, Hwasung Kim, et al.ACS Applied Materials & Interfaces|June 20, 2015
Controlled Layer-by-Layer Etching of MoS₂TaiZhe Lin, BaoTao Kang, MinHwan Jeon, et al.Pageof 1