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Optics Letters|October 2, 2013
Enhancement of outcoupling efficiency of organic light-emitting diodes using a planarized moth-eye structure on glass substrateJeong Ho Kim, Lee-Mi Do, Je-Hong Choi, et al.Journal of Nanoscience and Nanotechnology|September 13, 2012
Pattern uniformity in large-area ultraviolet nano-imprinting by a cylindrically inflated flexible mold under low pressureGeehong Kim, Mira Jeong, Hyungjun Lim, et al.Journal of Nanoscience and Nanotechnology|July 26, 2011
Moisture-induced hysteresis of pentacene thin film transistors with cross-linked poly(4-vinylphenol) gate dielectricsJun Ho Kim, Kyu-Ha Beak, Ki Chul Song, et al.Journal of Nanoscience and Nanotechnology|May 5, 2015
Application of thermal initiator for characteristic improvements of polymeric replica mold for UV nanoimprint lithographyYe-Sul Jeong, Jaehoon Park, Bong Kuk Lee, et al.Journal of Nanoscience and Nanotechnology|November 23, 2011
Effects of seed layer patterns on the structural characteristics of hydrothermally grown ZnO nanorodsAh Ra Kim, Jong Hoon Lee, Chang Hoi Kim, et al.ACS Applied Materials & Interfaces|December 26, 2015
Optimization of a Solution-Processed SiO2 Gate Insulator by Plasma Treatment for Zinc Oxide Thin Film TransistorsYesul Jeong, Christopher Pearson, Hyun-Gwan Kim, et al.RSC Advances|November 25, 2024
Rapid activation of a solution-processed aluminum oxide gate dielectric through intense pulsed light irradiationYeon-Wha Oh, Hoon Kim, Lee-Mi Do, et al.Journal of Nanoscience and Nanotechnology|April 2, 2011
Sub-30 nm gate template fabrication for nanoimprint lithography using spacer patterning technologyKun-Sik Park, Kyu-Ha Baik, Dong-Pyo Kim, et al.ACS Applied Materials & Interfaces|October 7, 2014
Solution-processable LaZrOx/SiO2 gate dielectric at low temperature of 180 °C for high-performance metal oxide field-effect transistorsSo Yeon Je, Byeong-Geun Son, Hyun-Gwan Kim, et al.Journal of Nanoscience and Nanotechnology|April 3, 2010
Sub-50 nm template fabrications for nanoimprint lithography using hydrogen silsesquioxane and silicon nitrideJae Yeob Shim, Kyu-Ha Baek, Kun-Sik Park, et al.Pageof 2