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Lisong Dong

Showing results (1-10 of 51) with videos related to

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Journal of the Optical Society of America. A, Optics, Image Science, and Vision|July 4, 2012
Mask optimization approaches in optical lithography based on a vector imaging modelXu Ma, Yanqiu Li, Lisong Dong
Applied Optics|April 3, 2024
Method for optical proximity correction based on a vector imaging modelRuixuan Wu, Lisong Dong, Yayi Wei
Applied Optics|April 3, 2024
SCAPSM: attenuated phase-shift mask structure for EUV lithographyChen Li, Lisong Dong, Yayi Wei
Optics Express|October 7, 2021
Compensation of EUV lithography mask blank defect based on an advanced genetic algorithmRuixuan Wu, Lisong Dong, Xu Ma, et al.
Optics Express|November 22, 2024
LIC-CGAN: fast lithography latent images calculation method for large-area masks using deep learningYihan Zhao, Lisong Dong, Ziqi Li, et al.
Applied Optics|October 19, 2023
Aberration budget analysis of EUV lithography from the imaging performance of a contact layer in a 5  nm technology nodeZhishu Chen, Lisong Dong, Huwen Ding, et al.
Optics Express|June 29, 2023
Decomposition-learning-based thick-mask model for partially coherent lithography systemZiqi Li, Lisong Dong, Xu Ma, et al.
Applied Optics|March 10, 2021
Aberration optimization in an extreme ultraviolet lithography projector via a BP neural network and simulated annealing algorithmRongbo Zhao, Lisong Dong, Rui Chen, et al.
The Review of Scientific Instruments|September 5, 2025
Target recognition and grasping strategies for soft robotic manipulators in unstructured environmentsLisong Dong, Huiru Zhu, Yuan Chen, et al.
Micromachines|November 27, 2025
A Two-Stage Unet Framework for Sub-Resolution Assist Feature PredictionMu Lin, Le Ma, Lisong Dong, et al.
Pageof 6

Showing results (1-10 of 51) with videos related to

Sort By:
Pageof 6
Journal of the Optical Society of America. A, Optics, Image Science, and Vision|July 4, 2012
Mask optimization approaches in optical lithography based on a vector imaging modelXu Ma, Yanqiu Li, Lisong Dong
Applied Optics|April 3, 2024
Method for optical proximity correction based on a vector imaging modelRuixuan Wu, Lisong Dong, Yayi Wei
Applied Optics|April 3, 2024
SCAPSM: attenuated phase-shift mask structure for EUV lithographyChen Li, Lisong Dong, Yayi Wei
Optics Express|October 7, 2021
Compensation of EUV lithography mask blank defect based on an advanced genetic algorithmRuixuan Wu, Lisong Dong, Xu Ma, et al.
Optics Express|November 22, 2024
LIC-CGAN: fast lithography latent images calculation method for large-area masks using deep learningYihan Zhao, Lisong Dong, Ziqi Li, et al.
Applied Optics|October 19, 2023
Aberration budget analysis of EUV lithography from the imaging performance of a contact layer in a 5  nm technology nodeZhishu Chen, Lisong Dong, Huwen Ding, et al.
Optics Express|June 29, 2023
Decomposition-learning-based thick-mask model for partially coherent lithography systemZiqi Li, Lisong Dong, Xu Ma, et al.
Applied Optics|March 10, 2021
Aberration optimization in an extreme ultraviolet lithography projector via a BP neural network and simulated annealing algorithmRongbo Zhao, Lisong Dong, Rui Chen, et al.
The Review of Scientific Instruments|September 5, 2025
Target recognition and grasping strategies for soft robotic manipulators in unstructured environmentsLisong Dong, Huiru Zhu, Yuan Chen, et al.
Micromachines|November 27, 2025
A Two-Stage Unet Framework for Sub-Resolution Assist Feature PredictionMu Lin, Le Ma, Lisong Dong, et al.
Pageof 6