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Applied Optics|August 14, 2010
Nd:YAG laser machining with multilevel resist kinoformsM Ekberg, M Larsson, A Bolle, et al.Optics Letters|September 22, 2009
Multilevel phase holograms manufactured by electron-beam lithographyM Ekberg, M Larsson, S Hård, et al.Applied Optics|September 24, 2010
Proximity-compensated blazed transmission grating manufacture with direct-writing, electron-beam lithographyM Ekberg, F Nikolajeff, M Larsson, et al.Applied Optics|September 24, 2010
Successive development optimization of resist kinoforms manufactured with direct-writing, electron-beam lithographyM Larsson, M Ekberg, F Nikolajeff, et al.Applied Optics|November 2, 2010
Measuring and modeling the proximity effect in direct-write electron-beam lithography kinoformsF Nikolajeff, J Bengtsson, M Larsson, et al.Applied Optics|June 26, 2010
Single photomask, multilevel kinoforms in quartz and photoresist: manufacture and evaluationH Andersson, M Ekberg, S Hård, et al.Applied Optics|May 22, 2010
Partially illuminated kinoforms: a computer studyS Jacobsson, S Hård, A BolleApplied Optics|March 22, 2008
Laser-triggered high-voltage plasma switching with diffractive opticsM Ekberg, A Sunesson, M Bergkvist, et al.Applied Optics|September 24, 2010
Letter imaging by diffractive, bifocal intraocular lenses: a computer studyC Dahnér, M Larsson, A Nyström, et al.Applied Optics|August 20, 2010
Optical properties of diffractive, bifocal, intraocular lensesM Larsson, C Beckman, A Nyström, et al.Pageof 58