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Chemistry of Materials : a Publication of the American Chemical Society|April 14, 2017
Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma FunctionalizationRené H J Vervuurt, Bora Karasulu, Marcel A Verheijen, et al.
The Journal of Cell Biology|September 21, 2001
The actin-binding protein Hip1R associates with clathrin during early stages of endocytosis and promotes clathrin assembly in vitroA E Engqvist-Goldstein, R A Warren, M M Kessels, et al.
ACS Applied Materials & Interfaces|September 23, 2015
Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier LayersAnne-Marije Andringa, Alberto Perrotta, Koen de Peuter, et al.
Chemistry of Materials : a Publication of the American Chemical Society|July 19, 2021
Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2Karsten Arts, Harvey Thepass, Marcel A Verheijen, et al.
Nanotechnology|December 17, 2025
Growth behavior during metalorganic chemical vapor deposition of MoS2using di-tert-butyl sulfide as organic sulfur precursorSanne Deijkers, Henry Medina Silva, Apostolia Manasi, et al.
ACS Applied Nano Materials|August 29, 2024
Influence of High-κ Dielectrics Integration on ALD-Based MoS2 Field-Effect Transistor PerformanceReyhaneh Mahlouji, Yue Zhang, Marcel A Verheijen, et al.
The Journal of Physical Chemistry. C, Nanomaterials and Interfaces|December 18, 2025
Spatial Atomic Layer Deposition of IrO x Using (EtCp)Ir(CHD) and Atmospheric O2/N2 PlasmaMike L van de Poll, Jie Shen, Paul Poodt, et al.
The Journal of Chemical Physics|February 10, 2017
Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenchesI J M Erkens, M A Verheijen, H C M Knoops, et al.
The Journal of Physical Chemistry Letters|July 16, 2024
The Consequences of Random Sequential Adsorption for the Precursor Packing and Growth-Per-Cycle of Atomic Layer Deposition ProcessesI Tezsevin, J H Deijkers, M J M Merkx, et al.
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