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Methodsx|October 13, 2018
Guidelines for establishing an etching procedure for dislocation density measurements on multicrystalline silicon samplesKrzysztof Adamczyk, Gaute Stokkan, Marisa Di SabatinoAnalytical and Bioanalytical Chemistry|August 23, 2014
On copper diffusion in silicon measured by glow discharge mass spectrometryChiara Modanese, Guilherme Gaspar, Lars Arnberg, et al.Journal of Mass Spectrometry : JMS|July 12, 2021
Application of 7N In as secondary cathode for the direct current-glow discharge mass spectrometry analysis of solid, fused high-purity quartzJochen Busam, Gaute Stokkan, Astrid Marie F Muggerud, et al.Materials (Basel, Switzerland)|February 13, 2026
Challenges and Practices in the Analysis of Silicon Kerf from the PV Industry by Combinatorial Analytical MethodsTinotenda Mubaiwa, Marisa Di Sabatino, Sergey Khromov, et al.Methodsx|March 27, 2023
Novel combinatory method for surface and crystallinity analysis of crystalline materials: Combinatory analysis method for crystalline materials surfaceVladyslav Matkivskyi, Arne Karstein Røyset, Gaute Stokkan, et al.RSC Advances|April 26, 2024
Influence of aluminium doping on high purity quartz glass propertiesBartłomiej Adam Gaweł, Jochen Busam, Astrid Marthinsen, et al.Materials (Basel, Switzerland)|August 26, 2023
Atomic Layer Deposition of Titanium Oxide-Based Films for Semiconductor Applications-Effects of Precursor and Operating ConditionsVladyslav Matkivskyi, Oskari Leiviskä, Sigurd Wenner, et al.Physical Chemistry Chemical Physics : PCCP|January 31, 2025
Al doped silica glass: investigation of structural response and defect interactions based on crystalline modelsAstrid Marthinsen, Bartłomiej Adam Gaweł, Gabriela Kazimiera Warden, et al.Nanoscale Research Letters|February 13, 2019
Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon DioxideZhen Zhu, Perttu Sippola, Oili M E Ylivaara, et al.Pageof 1