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The Review of Scientific Instruments|March 3, 2010
A new flexible scatterometer for critical dimension metrologyMatthias Wurm, Frank Pilarski, Bernd BodermannOptics Express|April 1, 2020
Some aspects on the uncertainty calculation in Mueller ellipsometryMatthias Wurm, Tobias Grunewald, Sven Teichert, et al.Optics Express|March 10, 2018
Metrology of nanoscale grating structures by UV scatterometryMatthias Wurm, Johannes Endres, Jürgen Probst, et al.Applied Optics|February 23, 2023
In situ, back-focal-plane-based determination of the numerical apertures in optical microscopesJan Krüger, Detlef Bergmann, Rainer Köning, et al.ACS Omega|April 21, 2025
Spectroscopic Ellipsometry of Plasmonic Gratings-Ideal Parameters for Sensing and Subpicometer Measurement UncertaintyDeshabrato Mukherjee, Sven Burger, Thomas Siefke, et al.Lab on a Chip|February 8, 2012
Mechanical disruption of mammalian cells in a microfluidic system and its numerical analysis based on computational fluid dynamicsMatthias Wurm, An-Ping ZengScientific Reports|January 31, 2018
Using DNA origami nanorulers as traceable distance measurement standards and nanoscopic benchmark structuresMario Raab, Ija Jusuk, Julia Molle, et al.Analytical Biochemistry|February 3, 2019
Direct and highly sensitive measurement of fluorescent molecules in bulk solutions using flow cytometryMatthias Wurm, Sibel Ilhan, Uwe Jandt, et al.Optics Express|August 6, 2020
Quasi-bound states in the continuum for deep subwavelength structural information retrieval for DUV nano-optical polarizersThomas Siefke, Carol B Rojas Hurtado, Johannes Dickmann, et al.Optics Express|July 14, 2016
Optical field and attractive force at the subwavelength slitDavid Shapiro, Daniel Nies, Oleg Belai, et al.Pageof 2