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Michal Stach

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Nanotechnology|March 2, 2013
Post-lithography pattern modification and its application to a tunable wire grid polarizerMichal Stach, En-Chiang Chang, Chung-Yuan Yang, et al.
Sensors (Basel, Switzerland)|June 6, 2012
A high sensitivity three-dimensional-shape sensing patch prepared by lithography and inkjet printingYi-Ren Huang, Sheng-An Kuo, Michal Stach, et al.
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Showing results (1-10 of 2) with videos related to

Sort By:
Pageof 1
Nanotechnology|March 2, 2013
Post-lithography pattern modification and its application to a tunable wire grid polarizerMichal Stach, En-Chiang Chang, Chung-Yuan Yang, et al.
Sensors (Basel, Switzerland)|June 6, 2012
A high sensitivity three-dimensional-shape sensing patch prepared by lithography and inkjet printingYi-Ren Huang, Sheng-An Kuo, Michal Stach, et al.
Pageof 1