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The Journal of Physical Chemistry. B|April 4, 2025
Investigating the Impact of the Spatial Arrangement of the Terminal Methyl Group Relative to the Bridging Ethylene Group on the Properties of PMO FilmsDmitry A Vorotyntsev, Alexey S Vishnevskiy, Dmitry S Seregin, et al.
Langmuir : the ACS Journal of Surfaces and Colloids|April 9, 2008
Reaction of trimethylchlorosilane in spin-on Silicalite-1 zeolite filmSalvador Eslava, Stephane Delahaye, Mikhail R Baklanov, et al.
Langmuir : the ACS Journal of Surfaces and Colloids|November 23, 2007
Characterization of a molecular sieve coating using ellipsometric porosimetrySalvador Eslava, Mikhail R Baklanov, Christine E A Kirschhock, et al.
Journal of Nanoscience and Nanotechnology|November 22, 2011
Influence of varying porogen loads and different UV cures on low-kappa film characteristicsLeo Farrell, Patrick Verdonck, Els Van Besien, et al.
Langmuir : the ACS Journal of Surfaces and Colloids|September 5, 2013
Atomic layer deposition of TiO2 on surface modified nanoporous low-k filmsElisabeth Levrau, Kilian Devloo-Casier, Jolien Dendooven, et al.
Materials (Basel, Switzerland)|August 16, 2017
Pore Narrowing of Mesoporous Silica MaterialsFrederik Goethals, Elisabeth Levrau, Els De Canck, et al.
Langmuir : the ACS Journal of Surfaces and Colloids|February 7, 2012
In situ monitoring of atomic layer deposition in nanoporous thin films using ellipsometric porosimetryJolien Dendooven, Kilian Devloo-Casier, Elisabeth Levrau, et al.
Nanomaterials (Basel, Switzerland)|April 28, 2023
UV-Excited Luminescence in Porous Organosilica Films with Various Organic ComponentsMd Rasadujjaman, Jinming Zhang, Dmitry A Spassky, et al.
Journal of the American Chemical Society|December 5, 2008
Zeolite-inspired low-k dielectrics overcoming limitations of zeolite filmsSalvador Eslava, Jone Urrutia, Abheesh N Busawon, et al.
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