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Journal of Nanoscience and Nanotechnology
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January 5, 2016
Effect of Embedded RF Pulsing for Selective Etching of SiO2 in the Dual-Frequency Capacitive Coupled Plasmas
Nam Hun Kim, Min Hwan Jeon, Tae Hyung Kim, et al.
Journal of Nanoscience and Nanotechnology
|
January 5, 2016
Etch Properties of Amorphous Carbon Material Using RF Pulsing in the O2/N2/CHF3 Plasma
Min Hwan Jeon, Jin Woo Park, Deok Hyun Yun, et al.
Journal of Chromatography. A
|
April 7, 2009
Detection of albiflorin and paeoniflorin in Paeoniae radix by reversed-phase high-performance liquid chromatography with pulsed amperometric detection
Min-Hwan Jeon, Ha-Jeong Kwon, Ji-Seon Jeong, et al.
Nanoscale
|
November 12, 2014
Cyclic chlorine trap-doping for transparent, conductive, thermally stable and damage-free graphene
Viet Phuong Pham, Kyong Nam Kim, Min Hwan Jeon, et al.
Journal of Nanoscience and Nanotechnology
|
January 5, 2016
Surface Modification of Block Copolymer Through Sulfur Containing Plasma Treatment
Sang Wook Choi, Jae Hee Shin, Min Hwan Jeon, et al.
Journal of Nanoscience and Nanotechnology
|
November 26, 2013
Plasma treatment of thin film coated with graphene flakes for the reduction of sheet resistance
Sung Hee Kim, Jong Sik Oh, Kyong Nam Kim, et al.
Journal of Nanoscience and Nanotechnology
|
May 15, 2015
Etch characteristics of magnetic tunnel junction materials using bias pulsing in the CH4/N2O inductively coupled plasma
Min Hwan Jeon, Ji Youn Youn, Kyung Chae Yang, et al.
Nanotechnology
|
August 13, 2015
Controlled MoS₂ layer etching using CF₄ plasma
Min Hwan Jeon, Chisung Ahn, HyeongU Kim, et al.
Journal of Nanoscience and Nanotechnology
|
May 15, 2015
Effect of RF pulsing biasing on the etching of magnetic tunnel junction materials using CH3OH
Min Hwan Jeon, Deok Hyun Yun, Kyung Chae Yang, et al.
ACS Nano
|
January 29, 2015
Controllable nondegenerate p-type doping of tungsten diselenide by octadecyltrichlorosilane
Dong-Ho Kang, Jaewoo Shim, Sung Kyu Jang, et al.
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of 2
Search research articles
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Showing results (1-10 of 13) with videos related to
Sort By:
Page
of 2
Journal of Nanoscience and Nanotechnology
|
January 5, 2016
Effect of Embedded RF Pulsing for Selective Etching of SiO2 in the Dual-Frequency Capacitive Coupled Plasmas
Nam Hun Kim, Min Hwan Jeon, Tae Hyung Kim, et al.
Journal of Nanoscience and Nanotechnology
|
January 5, 2016
Etch Properties of Amorphous Carbon Material Using RF Pulsing in the O2/N2/CHF3 Plasma
Min Hwan Jeon, Jin Woo Park, Deok Hyun Yun, et al.
Journal of Chromatography. A
|
April 7, 2009
Detection of albiflorin and paeoniflorin in Paeoniae radix by reversed-phase high-performance liquid chromatography with pulsed amperometric detection
Min-Hwan Jeon, Ha-Jeong Kwon, Ji-Seon Jeong, et al.
Nanoscale
|
November 12, 2014
Cyclic chlorine trap-doping for transparent, conductive, thermally stable and damage-free graphene
Viet Phuong Pham, Kyong Nam Kim, Min Hwan Jeon, et al.
Journal of Nanoscience and Nanotechnology
|
January 5, 2016
Surface Modification of Block Copolymer Through Sulfur Containing Plasma Treatment
Sang Wook Choi, Jae Hee Shin, Min Hwan Jeon, et al.
Journal of Nanoscience and Nanotechnology
|
November 26, 2013
Plasma treatment of thin film coated with graphene flakes for the reduction of sheet resistance
Sung Hee Kim, Jong Sik Oh, Kyong Nam Kim, et al.
Journal of Nanoscience and Nanotechnology
|
May 15, 2015
Etch characteristics of magnetic tunnel junction materials using bias pulsing in the CH4/N2O inductively coupled plasma
Min Hwan Jeon, Ji Youn Youn, Kyung Chae Yang, et al.
Nanotechnology
|
August 13, 2015
Controlled MoS₂ layer etching using CF₄ plasma
Min Hwan Jeon, Chisung Ahn, HyeongU Kim, et al.
Journal of Nanoscience and Nanotechnology
|
May 15, 2015
Effect of RF pulsing biasing on the etching of magnetic tunnel junction materials using CH3OH
Min Hwan Jeon, Deok Hyun Yun, Kyung Chae Yang, et al.
ACS Nano
|
January 29, 2015
Controllable nondegenerate p-type doping of tungsten diselenide by octadecyltrichlorosilane
Dong-Ho Kang, Jaewoo Shim, Sung Kyu Jang, et al.
Page
of 2