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Micromachines|November 27, 2025
A Two-Stage Unet Framework for Sub-Resolution Assist Feature PredictionMu Lin, Le Ma, Lisong Dong, et al.Journal of the Optical Society of America. A, Optics, Image Science, and Vision|July 4, 2012
Mask optimization approaches in optical lithography based on a vector imaging modelXu Ma, Yanqiu Li, Lisong DongOptics Express|October 7, 2021
Compensation of EUV lithography mask blank defect based on an advanced genetic algorithmRuixuan Wu, Lisong Dong, Xu Ma, et al.Optics Express|June 29, 2023
Decomposition-learning-based thick-mask model for partially coherent lithography systemZiqi Li, Lisong Dong, Xu Ma, et al.Optics Express|October 12, 2022
High-precision lithography thick-mask model based on a decomposition machine learning methodZiqi Li, Lisong Dong, Xuyu Jing, et al.Optics Express|April 27, 2022
Fast aerial image model for EUV lithography using the adjoint fully convolutional networkJiaxin Lin, Lisong Dong, Taian Fan, et al.Applied Optics|October 17, 2014
Inverse pupil wavefront optimization for immersion lithographyChunying Han, Yanqiu Li, Lisong Dong, et al.Applied Optics|September 14, 2023
Fast diffraction model of an EUV mask based on asymmetric patch data fittingZiqi Li, Xuyu Jing, Lisong Dong, et al.Optics Express|June 11, 2024
Cluster sampling and scalable Bayesian optimization with constraints for negative tone development resist model calibrationLe Ma, Xingyu Ma, Shaogang Hao, et al.Journal of the Optical Society of America. A, Optics, Image Science, and Vision|March 5, 2013
Pixelated source and mask optimization for immersion lithographyXu Ma, Chunying Han, Yanqiu Li, et al.Pageof 177