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Applied Optics|April 1, 2020
Fast extreme ultraviolet lithography mask near-field calculation method based on machine learningJiaxin Lin, Lisong Dong, Taian Fan, et al.Optics Express|September 13, 2019
Learning-based compressive sensing method for EUV lithographic source optimizationJiaxin Lin, Lisong Dong, Taian Fan, et al.Optics Express|June 8, 2018
Fast optical proximity correction method based on nonlinear compressive sensingXu Ma, Zhiqiang Wang, Yanqiu Li, et al.Applied Optics|July 12, 2013
Hybrid source mask optimization for robust immersion lithographyXu Ma, Chunying Han, Yanqiu Li, et al.Optics Express|July 19, 2020
EUV multilayer defect characterization via cycle-consistent learningYing Chen, Yibo Lin, Rui Chen, et al.Applied Optics|April 3, 2024
Method for optical proximity correction based on a vector imaging modelRuixuan Wu, Lisong Dong, Yayi WeiApplied Optics|April 3, 2024
SCAPSM: attenuated phase-shift mask structure for EUV lithographyChen Li, Lisong Dong, Yayi WeiOptics Express|November 22, 2024
LIC-CGAN: fast lithography latent images calculation method for large-area masks using deep learningYihan Zhao, Lisong Dong, Ziqi Li, et al.Applied Optics|October 19, 2023
Aberration budget analysis of EUV lithography from the imaging performance of a contact layer in a 5 nm technology nodeZhishu Chen, Lisong Dong, Huwen Ding, et al.Applied Optics|March 10, 2021
Aberration optimization in an extreme ultraviolet lithography projector via a BP neural network and simulated annealing algorithmRongbo Zhao, Lisong Dong, Rui Chen, et al.Pageof 177