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N N Salashchenko

Showing results (11-20 of 23) with videos related to

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Applied Optics|November 13, 2015
Application of point diffraction interferometry for measuring angular displacement to a sensitivity of 0.01 arcsecD A Gavrilin, S V Kuzin, N N Salashchenko, et al.
Applied Optics|February 3, 2016
Problems in the application of a null lens for precise measurements of aspheric mirrorsN I Chkhalo, I V Malyshev, A E Pestov, et al.
Applied Optics|April 26, 2022
Influence of ion-beam etching by Ar ions with an energy of 200-1000  eV on the roughness and sputtering yield of a single-crystal silicon surfaceM S Mikhailenko, A E Pestov, N I Chkhalo, et al.
Applied Optics|May 4, 2016
Advanced materials for multilayer mirrors for extreme ultraviolet solar astronomyS A Bogachev, N I Chkhalo, S V Kuzin, et al.
Optics Express|December 23, 2022
Influence of Mo interlayers on the microstructure of layers and reflective characteristics of Ru/Be multilayer mirrorsR M Smertin, N I Chkhalo, M N Drozdov, et al.
Journal of Synchrotron Radiation|August 29, 2003
Short-period multilayer X-ray mirrorsS S Andreev, M S Bibishkin, N I Chkhalo, et al.
Journal of X-Ray Science and Technology|July 9, 2019
X-ray scattering by the fused silica surface etched by low-energy Ar ionsM M Barysheva, N I Chkhalo, M N Drozdov, et al.
Applied Optics|January 16, 2019
Investigation of the thermo stability of aluminum thin-film filters with protective MoSi<sub>2</sub> cap layersN I Chkhalo, M N Drozdov, S A Gusev, et al.
Applied Optics|July 14, 2016
Thin film multilayer filters for solar EUV telescopesN I Chkhalo, M N Drozdov, E B Kluenkov, et al.
Journal of X-Ray Science and Technology|February 11, 2011
Normal-incidence multilayer mirrors for the 120-450 å wavelength regionS V Gaponov, S A Gusev, V V Dubrov, et al.
Pageof 3

Showing results (11-20 of 23) with videos related to

Sort By:
Pageof 3
Applied Optics|November 13, 2015
Application of point diffraction interferometry for measuring angular displacement to a sensitivity of 0.01 arcsecD A Gavrilin, S V Kuzin, N N Salashchenko, et al.
Applied Optics|February 3, 2016
Problems in the application of a null lens for precise measurements of aspheric mirrorsN I Chkhalo, I V Malyshev, A E Pestov, et al.
Applied Optics|April 26, 2022
Influence of ion-beam etching by Ar ions with an energy of 200-1000  eV on the roughness and sputtering yield of a single-crystal silicon surfaceM S Mikhailenko, A E Pestov, N I Chkhalo, et al.
Applied Optics|May 4, 2016
Advanced materials for multilayer mirrors for extreme ultraviolet solar astronomyS A Bogachev, N I Chkhalo, S V Kuzin, et al.
Optics Express|December 23, 2022
Influence of Mo interlayers on the microstructure of layers and reflective characteristics of Ru/Be multilayer mirrorsR M Smertin, N I Chkhalo, M N Drozdov, et al.
Journal of Synchrotron Radiation|August 29, 2003
Short-period multilayer X-ray mirrorsS S Andreev, M S Bibishkin, N I Chkhalo, et al.
Journal of X-Ray Science and Technology|July 9, 2019
X-ray scattering by the fused silica surface etched by low-energy Ar ionsM M Barysheva, N I Chkhalo, M N Drozdov, et al.
Applied Optics|January 16, 2019
Investigation of the thermo stability of aluminum thin-film filters with protective MoSi<sub>2</sub> cap layersN I Chkhalo, M N Drozdov, S A Gusev, et al.
Applied Optics|July 14, 2016
Thin film multilayer filters for solar EUV telescopesN I Chkhalo, M N Drozdov, E B Kluenkov, et al.
Journal of X-Ray Science and Technology|February 11, 2011
Normal-incidence multilayer mirrors for the 120-450 å wavelength regionS V Gaponov, S A Gusev, V V Dubrov, et al.
Pageof 3