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Applied Optics|September 8, 2010
Metrology of lithographic features: balanced illumination eliminating diffractive biasP N Everett
Applied Optics|February 2, 2010
Long-range holographyP N Everett, A J Cantor
Applied Optics|August 31, 2010
Aligning lithography on opposite surfaces of a substrateP N Everett, W F Delaney
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