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P Naulleau

Showing results (1-10 of 43) with videos related to

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Applied Optics|February 12, 2008
Analysis of the confined-reference coherence-encoding method for image transmission through optical fibersP Naulleau
Applied Optics|June 23, 2009
Correlation method for the measure of mask-induced line-edge roughness in extreme ultraviolet lithographyPatrick P Naulleau
Applied Optics|February 13, 2004
Verification of point-spread-function-based modeling of an extreme-ultraviolet photoresistPatrick P Naulleau
Applied Optics|February 1, 2005
Effect of mask-roughness on printed contact-size variation in extreme-ultraviolet lithographyPatrick P Naulleau
Applied Optics|August 3, 2004
Relevance of mask-roughness-induced printed line-edge roughness in recent and future extreme-ultraviolet lithography testsPatrick P Naulleau
Applied Optics|December 4, 2010
Motion-resolved imaging of moving objects embedded within scattering media by the use of time-gated speckle analysisP Naulleau, D Dilworth
Applied Optics|November 25, 2010
Noise analysis for the holographic first-arriving-light techniqueP Naulleau, D Dilworth
Applied Optics|November 6, 2010
Stretch, time lenses, and incoherent time imagingP Naulleau, E Leith
Optics Letters|October 30, 2009
Holographic first-arriving-light signal-to-noise ratio enhancement by differential holographyP Naulleau, D Dilworth
Applied Optics|July 12, 2011
Validity of the thin mask approximation in extreme ultraviolet mask roughness simulationsPatrick P Naulleau, Simi A George
Pageof 5

Showing results (1-10 of 43) with videos related to

Sort By:
Pageof 5
Applied Optics|February 12, 2008
Analysis of the confined-reference coherence-encoding method for image transmission through optical fibersP Naulleau
Applied Optics|June 23, 2009
Correlation method for the measure of mask-induced line-edge roughness in extreme ultraviolet lithographyPatrick P Naulleau
Applied Optics|February 13, 2004
Verification of point-spread-function-based modeling of an extreme-ultraviolet photoresistPatrick P Naulleau
Applied Optics|February 1, 2005
Effect of mask-roughness on printed contact-size variation in extreme-ultraviolet lithographyPatrick P Naulleau
Applied Optics|August 3, 2004
Relevance of mask-roughness-induced printed line-edge roughness in recent and future extreme-ultraviolet lithography testsPatrick P Naulleau
Applied Optics|December 4, 2010
Motion-resolved imaging of moving objects embedded within scattering media by the use of time-gated speckle analysisP Naulleau, D Dilworth
Applied Optics|November 25, 2010
Noise analysis for the holographic first-arriving-light techniqueP Naulleau, D Dilworth
Applied Optics|November 6, 2010
Stretch, time lenses, and incoherent time imagingP Naulleau, E Leith
Optics Letters|October 30, 2009
Holographic first-arriving-light signal-to-noise ratio enhancement by differential holographyP Naulleau, D Dilworth
Applied Optics|July 12, 2011
Validity of the thin mask approximation in extreme ultraviolet mask roughness simulationsPatrick P Naulleau, Simi A George
Pageof 5