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Applied Optics|July 12, 2011
Validity of the thin mask approximation in extreme ultraviolet mask roughness simulationsPatrick P Naulleau, Simi A GeorgeApplied Optics|August 19, 2008
Tilt sensitivity of the two-grating interferometerChristopher N Anderson, Patrick P NaulleauApplied Optics|June 21, 2003
Line-edge roughness transfer function and its application to determining mask effects in EUV resist characterizationPatrick P Naulleau, Gregg M GallatinApplied Optics|November 25, 2010
Analysis of direct three-dimensional image transmission through optical fibers by the use of coherence methodsP Naulleau, C Chen, E LeithApplied Optics|December 25, 2007
Sensitivity study of two high-throughput resolution metrics for photoresistsChristopher N Anderson, Patrick P NaulleauApplied Optics|November 12, 2010
Lensless imaging by spatial Fourier synthesis holographyE Arons, D DilworthApplied Optics|November 25, 2010
Improved imagery through scattering materials by quasi-Fourier-synthesis holographyE Arons, D DilworthApplied Optics|November 2, 2010
Analysis of Fourier synthesis holography for imaging through scattering materialsE Arons, D DilworthPageof 6