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Patrick P Naulleau

Showing results (1-10 of 22) with videos related to

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Applied Optics|June 23, 2009
Correlation method for the measure of mask-induced line-edge roughness in extreme ultraviolet lithographyPatrick P Naulleau
Applied Optics|February 13, 2004
Verification of point-spread-function-based modeling of an extreme-ultraviolet photoresistPatrick P Naulleau
Applied Optics|February 1, 2005
Effect of mask-roughness on printed contact-size variation in extreme-ultraviolet lithographyPatrick P Naulleau
Applied Optics|August 3, 2004
Relevance of mask-roughness-induced printed line-edge roughness in recent and future extreme-ultraviolet lithography testsPatrick P Naulleau
Applied Optics|July 12, 2011
Validity of the thin mask approximation in extreme ultraviolet mask roughness simulationsPatrick P Naulleau, Simi A George
Applied Optics|August 19, 2008
Tilt sensitivity of the two-grating interferometerChristopher N Anderson, Patrick P Naulleau
Applied Optics|June 21, 2003
Line-edge roughness transfer function and its application to determining mask effects in EUV resist characterizationPatrick P Naulleau, Gregg M Gallatin
Applied Optics|December 25, 2007
Sensitivity study of two high-throughput resolution metrics for photoresistsChristopher N Anderson, Patrick P Naulleau
Applied Optics|July 12, 2011
Optical modeling of Fresnel zoneplate microscopesPatrick P Naulleau, Iacopo Mochi, Kenneth A Goldberg
Applied Optics|April 21, 2006
Spin-on-glass coatings for the generation of superpolished substrates for use in the extreme-ultraviolet regionFarhad Salmassi, Patrick P Naulleau, Eric M Gullikson
Pageof 3

Showing results (1-10 of 22) with videos related to

Sort By:
Pageof 3
Applied Optics|June 23, 2009
Correlation method for the measure of mask-induced line-edge roughness in extreme ultraviolet lithographyPatrick P Naulleau
Applied Optics|February 13, 2004
Verification of point-spread-function-based modeling of an extreme-ultraviolet photoresistPatrick P Naulleau
Applied Optics|February 1, 2005
Effect of mask-roughness on printed contact-size variation in extreme-ultraviolet lithographyPatrick P Naulleau
Applied Optics|August 3, 2004
Relevance of mask-roughness-induced printed line-edge roughness in recent and future extreme-ultraviolet lithography testsPatrick P Naulleau
Applied Optics|July 12, 2011
Validity of the thin mask approximation in extreme ultraviolet mask roughness simulationsPatrick P Naulleau, Simi A George
Applied Optics|August 19, 2008
Tilt sensitivity of the two-grating interferometerChristopher N Anderson, Patrick P Naulleau
Applied Optics|June 21, 2003
Line-edge roughness transfer function and its application to determining mask effects in EUV resist characterizationPatrick P Naulleau, Gregg M Gallatin
Applied Optics|December 25, 2007
Sensitivity study of two high-throughput resolution metrics for photoresistsChristopher N Anderson, Patrick P Naulleau
Applied Optics|July 12, 2011
Optical modeling of Fresnel zoneplate microscopesPatrick P Naulleau, Iacopo Mochi, Kenneth A Goldberg
Applied Optics|April 21, 2006
Spin-on-glass coatings for the generation of superpolished substrates for use in the extreme-ultraviolet regionFarhad Salmassi, Patrick P Naulleau, Eric M Gullikson
Pageof 3