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Nanotechnology|October 23, 2024
Quantitative evaluation of residual resist in electron beam lithography based on scanning electron microscopy imaging and thresholding segmentation algorithmQingyuan Mao, Jingyuan Zhu, Zhanshan WangDiscover Nano|May 19, 2025
Proximity effect correction in electron beam lithography using a composite function model of electron scattering energy distributionQingyuan Mao, Jingyuan Zhu, Xinbin Cheng, et al.Pageof 1