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Applied Optics|May 22, 2010
Design considerations for holographic optical interconnectsR K Kostuk, J W Goodman, L HesselinkApplied Optics|September 1, 1985
Optical imaging applied to microelectronic chip-to-chip interconnectionsR K Kostuk, J W Goodman, L HesselinkApplied Optics|June 29, 2010
Refractive index modulation mechanism in bleached silver halide hologramsR K Kostuk, J W GoodmanOptics Letters|September 3, 2009
Real-time enhancement of defects in a periodic mask using photorefractive Bi(12)SiO(20)E Ochoa, J W Goodman, L HesselinkApplied Optics|February 29, 2008
Dynamic hologram recording characteristics in DuPont photopolymersR K KostukApplied Optics|August 12, 2010
Factorial optimization of bleach constituents for silver halide hologramsR K KostukApplied Optics|March 22, 2008
Interconnect characteristics of fiber image guidesR K Kostuk, J CarriereOptics Letters|September 16, 2009
Direct formation of planar holograms and noise gratings at 820 nm in bleached silver-halide emulsionsL Wang, R K KostukOptics Letters|October 31, 2009
Free-space holographic optical interconnects for board-to-board and chip-to-chip interconnectionsJ H Yeh, R K KostukPageof 15