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Reinhard Voelkel

Showing results (1-10 of 12) with videos related to

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Applied Optics|May 14, 2020
Tolerancing the surface form of aspheric microlenses manufactured by wafer-level optics techniquesJeremy Béguelin, Wilfried Noell, Toralf Scharf, et al.
Applied Optics|May 14, 2020
Optical characterization of high numerical aperture microlenses for quality assessment and fabrication process optimizationJeremy Béguelin, Michael Symeonidis, Wilfried Noell, et al.
Optics Express|October 14, 2010
Advanced mask aligner lithography: fabrication of periodic patterns using pinhole array mask and Talbot effectLorenz Stuerzebecher, Torsten Harzendorf, Uwe Vogler, et al.
Optics Express|March 17, 2019
Improvements on the uniformity of large-area microlens arrays in Fused SilicaRaoul Kirner, Jeremy Béguelin, Martin Eisner, et al.
Optics Express|November 6, 2019
Computational rule-based approach for corner correction of non-Manhattan geometries in mask aligner photolithographyAndreas Vetter, Chen Yan, Raoul Kirner, et al.
Optics Express|November 26, 2008
Two step process for the fabrication of diffraction limited concave microlens arraysPatrick Ruffieux, Toralf Scharf, Irène Philipoussis, et al.
Applied Optics|April 23, 2010
Flexible beam shaping system using fly's eye condenserNorbert Lindlein, Andreas Bich, Martin Eisner, et al.
Optics Express|August 23, 2018
Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light sourceAndreas Vetter, Raoul Kirner, Dmitrijs Opalevs, et al.
Optics Express|May 4, 2016
Refraction limit of miniaturized optical systems: a ball-lens exampleMyun-Sik Kim, Toralf Scharf, Stefan Mühlig, et al.
Optics Express|February 7, 2018
Mask-aligner lithography using a continuous-wave diode laser frequency-quadrupled to 193 nmRaoul Kirner, Andreas Vetter, Dmitrijs Opalevs, et al.
Pageof 2

Showing results (1-10 of 12) with videos related to

Sort By:
Pageof 2
Applied Optics|May 14, 2020
Tolerancing the surface form of aspheric microlenses manufactured by wafer-level optics techniquesJeremy Béguelin, Wilfried Noell, Toralf Scharf, et al.
Applied Optics|May 14, 2020
Optical characterization of high numerical aperture microlenses for quality assessment and fabrication process optimizationJeremy Béguelin, Michael Symeonidis, Wilfried Noell, et al.
Optics Express|October 14, 2010
Advanced mask aligner lithography: fabrication of periodic patterns using pinhole array mask and Talbot effectLorenz Stuerzebecher, Torsten Harzendorf, Uwe Vogler, et al.
Optics Express|March 17, 2019
Improvements on the uniformity of large-area microlens arrays in Fused SilicaRaoul Kirner, Jeremy Béguelin, Martin Eisner, et al.
Optics Express|November 6, 2019
Computational rule-based approach for corner correction of non-Manhattan geometries in mask aligner photolithographyAndreas Vetter, Chen Yan, Raoul Kirner, et al.
Optics Express|November 26, 2008
Two step process for the fabrication of diffraction limited concave microlens arraysPatrick Ruffieux, Toralf Scharf, Irène Philipoussis, et al.
Applied Optics|April 23, 2010
Flexible beam shaping system using fly's eye condenserNorbert Lindlein, Andreas Bich, Martin Eisner, et al.
Optics Express|August 23, 2018
Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light sourceAndreas Vetter, Raoul Kirner, Dmitrijs Opalevs, et al.
Optics Express|May 4, 2016
Refraction limit of miniaturized optical systems: a ball-lens exampleMyun-Sik Kim, Toralf Scharf, Stefan Mühlig, et al.
Optics Express|February 7, 2018
Mask-aligner lithography using a continuous-wave diode laser frequency-quadrupled to 193 nmRaoul Kirner, Andreas Vetter, Dmitrijs Opalevs, et al.
Pageof 2