Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Filters

Sascha Brose

Showing results (1-10 of 5) with videos related to

Pageof 1
Sort By:
Applied Optics|January 6, 2023
Nanoscale grating characterization using EUV scatterometry and soft x-ray scattering with plasma and synchrotron radiationLeonhard M Lohr, Richard Ciesielski, Sven Glabisch, et al.
Applied Optics|April 26, 2022
Design of an efficient illuminator for partially coherent sources in the extreme ultravioletBernhard Lüttgenau, Dieter Panitzek, Serhiy Danylyuk, et al.
Optics Express|July 19, 2020
Characterization of nanoscale gratings by spectroscopic reflectometry in the extreme ultraviolet with a stand-alone setupLukas Bahrenberg, Serhiy Danylyuk, Sven Glabisch, et al.
Optics Express|September 10, 2020
Computational proximity lithography with extreme ultraviolet radiationValerie Deuter, Maciej Grochowicz, Sascha Brose, et al.
Optics Express|October 20, 2015
Extreme ultraviolet proximity lithography for fast, flexible and parallel fabrication of infrared antennasGeorg Kunkemöller, Tobias W W Mass, Ann-Katrin U Michel, et al.
Pageof 1

Showing results (1-10 of 5) with videos related to

Sort By:
Pageof 1
Applied Optics|January 6, 2023
Nanoscale grating characterization using EUV scatterometry and soft x-ray scattering with plasma and synchrotron radiationLeonhard M Lohr, Richard Ciesielski, Sven Glabisch, et al.
Applied Optics|April 26, 2022
Design of an efficient illuminator for partially coherent sources in the extreme ultravioletBernhard Lüttgenau, Dieter Panitzek, Serhiy Danylyuk, et al.
Optics Express|July 19, 2020
Characterization of nanoscale gratings by spectroscopic reflectometry in the extreme ultraviolet with a stand-alone setupLukas Bahrenberg, Serhiy Danylyuk, Sven Glabisch, et al.
Optics Express|September 10, 2020
Computational proximity lithography with extreme ultraviolet radiationValerie Deuter, Maciej Grochowicz, Sascha Brose, et al.
Optics Express|October 20, 2015
Extreme ultraviolet proximity lithography for fast, flexible and parallel fabrication of infrared antennasGeorg Kunkemöller, Tobias W W Mass, Ann-Katrin U Michel, et al.
Pageof 1