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ACS Nano
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December 17, 2009
Formation of organic nanoscale laminates and blends by molecular layer deposition
Paul W Loscutoff, Han Zhou, Scott B Clendenning, et al.
ACS Applied Materials & Interfaces
|
July 16, 2020
Mechanism of Thermal Atomic Layer Etch of W Metal Using Sequential Oxidation and Chlorination: A First-Principles Study
Suresh Kondati Natarajan, Michael Nolan, Patrick Theofanis, et al.
Chemical Communications (Cambridge, England)
|
March 27, 2004
UV photopatterning of a highly metallized, cluster-containing poly(ferrocenylsilane)
Alison Y Cheng, Scott B Clendenning, Guocheng Yang, et al.
Chemistry (Weinheim an Der Bergstrasse, Germany)
|
June 15, 2007
Synthesis of the 2,4,5-tri-tert-butyl-1,3-diphospholide anion by phosphinidene elimination from 2,4,6-tri-tert-butyl-1,3,5-triphosphabenzene on treatment with the amide Li[NPh(SiMe3)]
Scott B Clendenning, Peter B Hitchcock, Michael F Lappert, et al.
Journal of the American Chemical Society
|
February 11, 2005
Highly metallized polymers: synthesis, characterization, and lithographic patterning of polyferrocenylsilanes with pendant cobalt, molybdenum, and nickel cluster substituents
Wing Yan Chan, Scott B Clendenning, Andrea Berenbaum, et al.
Journal of the American Chemical Society
|
April 7, 2005
Poisoning of heterogeneous, late transition metal dehydrocoupling catalysts by boranes and other group 13 hydrides
Cory A Jaska, Timothy J Clark, Scott B Clendenning, et al.
Inorganic Chemistry
|
November 24, 2020
Synthesis of Silyl Aluminum Reagents: Relevance Toward Atomic Layer Deposition of Metal Silicides and the Serendipitous Synthesis of a Novel Al-Hydride Cluster
Roman Bashkurov, Yosi Kratish, Charles C Mokhtarzadeh, et al.
Chemistry (Weinheim an Der Bergstrasse, Germany)
|
May 19, 2005
Rhodium-catalyzed dehydrocoupling of fluorinated phosphine-borane adducts: synthesis, characterization, and properties of cyclic and polymeric phosphinoboranes with electron-withdrawing substituents at phosphorus
Timothy J Clark, José M Rodezno, Scott B Clendenning, et al.
The Journal of Chemical Physics
|
May 22, 2024
In situ formation of inhibitor species through catalytic surface reactions during area-selective atomic layer deposition of TaN
Marc J M Merkx, Ilker Tezsevin, Pengmei Yu, et al.
Advanced Materials (Deerfield Beach, Fla.)
|
October 22, 2022
Atomic Layer Deposition of Sb<sub>2</sub> Te<sub>3</sub> /GeTe Superlattice Film and Its Melt-Quenching-Free Phase-Transition Mechanism for Phase-Change Memory
Chanyoung Yoo, Jeong Woo Jeon, Seungjae Yoon, et al.
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Search research articles
Search
Showing results (1-10 of 12) with videos related to
Sort By:
Page
of 2
ACS Nano
|
December 17, 2009
Formation of organic nanoscale laminates and blends by molecular layer deposition
Paul W Loscutoff, Han Zhou, Scott B Clendenning, et al.
ACS Applied Materials & Interfaces
|
July 16, 2020
Mechanism of Thermal Atomic Layer Etch of W Metal Using Sequential Oxidation and Chlorination: A First-Principles Study
Suresh Kondati Natarajan, Michael Nolan, Patrick Theofanis, et al.
Chemical Communications (Cambridge, England)
|
March 27, 2004
UV photopatterning of a highly metallized, cluster-containing poly(ferrocenylsilane)
Alison Y Cheng, Scott B Clendenning, Guocheng Yang, et al.
Chemistry (Weinheim an Der Bergstrasse, Germany)
|
June 15, 2007
Synthesis of the 2,4,5-tri-tert-butyl-1,3-diphospholide anion by phosphinidene elimination from 2,4,6-tri-tert-butyl-1,3,5-triphosphabenzene on treatment with the amide Li[NPh(SiMe3)]
Scott B Clendenning, Peter B Hitchcock, Michael F Lappert, et al.
Journal of the American Chemical Society
|
February 11, 2005
Highly metallized polymers: synthesis, characterization, and lithographic patterning of polyferrocenylsilanes with pendant cobalt, molybdenum, and nickel cluster substituents
Wing Yan Chan, Scott B Clendenning, Andrea Berenbaum, et al.
Journal of the American Chemical Society
|
April 7, 2005
Poisoning of heterogeneous, late transition metal dehydrocoupling catalysts by boranes and other group 13 hydrides
Cory A Jaska, Timothy J Clark, Scott B Clendenning, et al.
Inorganic Chemistry
|
November 24, 2020
Synthesis of Silyl Aluminum Reagents: Relevance Toward Atomic Layer Deposition of Metal Silicides and the Serendipitous Synthesis of a Novel Al-Hydride Cluster
Roman Bashkurov, Yosi Kratish, Charles C Mokhtarzadeh, et al.
Chemistry (Weinheim an Der Bergstrasse, Germany)
|
May 19, 2005
Rhodium-catalyzed dehydrocoupling of fluorinated phosphine-borane adducts: synthesis, characterization, and properties of cyclic and polymeric phosphinoboranes with electron-withdrawing substituents at phosphorus
Timothy J Clark, José M Rodezno, Scott B Clendenning, et al.
The Journal of Chemical Physics
|
May 22, 2024
In situ formation of inhibitor species through catalytic surface reactions during area-selective atomic layer deposition of TaN
Marc J M Merkx, Ilker Tezsevin, Pengmei Yu, et al.
Advanced Materials (Deerfield Beach, Fla.)
|
October 22, 2022
Atomic Layer Deposition of Sb<sub>2</sub> Te<sub>3</sub> /GeTe Superlattice Film and Its Melt-Quenching-Free Phase-Transition Mechanism for Phase-Change Memory
Chanyoung Yoo, Jeong Woo Jeon, Seungjae Yoon, et al.
Page
of 2