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A Method to Fabricate Disconnected Silver Nanostructures in 3D
Published on: November 27, 2012
UV photopatterning of a highly metallized, cluster-containing poly(ferrocenylsilane)
Alison Y Cheng1, Scott B Clendenning, Guocheng Yang
1Department of Chemistry, University of Toronto, 80 St. George Street, Toronto, Ontario, Canada M5S 3H6.
Chemical Communications (Cambridge, England)
|March 27, 2004
Abstract:
Thin films of a cobalt-clusterized poly(ferrocenylsilane) have been shown to behave as a negative-tone resist for UV photolithography, allowing access to feature sizes between 20 and 300 microm. Pyrolysis of the patterned polymer at 900 degrees C under a N(2) atmosphere afforded patterned ferromagnetic ceramics with excellent shape retention.
