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Seonghyeon Oh

Showing results (1-10 of 5) with videos related to

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Scientific Reports|June 5, 2019
Theoretical analysis of high-efficient dielectric nanofocusing for the generation of a brightness light sourceChanghoon Park, Seonghyeon Oh, Jae W Hahn
Optics Letters|July 2, 2013
Multifunctional bowtie-shaped ridge aperture for overlay alignment in plasmonic direct writing lithography using a contact probeSeonghyeon Oh, Taekyong Lee, Jae W Hahn
Scientific Reports|August 31, 2017
Nanoscale 2.5-dimensional surface patterning with plasmonic lithographyHowon Jung, Changhoon Park, Seonghyeon Oh, et al.
Nanotechnology|March 21, 2013
Imaging heterogeneous nanostructures with a plasmonic resonant ridge apertureTaekyong Lee, Eungman Lee, Seonghyeon Oh, et al.
Nanotechnology|December 6, 2017
Optical proximity correction (OPC) in near-field lithography with pixel-based field sectioning time modulationSeonghyeon Oh, Dandan Han, Hyeon Bo Shim, et al.
Pageof 1

Showing results (1-10 of 5) with videos related to

Sort By:
Pageof 1
Scientific Reports|June 5, 2019
Theoretical analysis of high-efficient dielectric nanofocusing for the generation of a brightness light sourceChanghoon Park, Seonghyeon Oh, Jae W Hahn
Optics Letters|July 2, 2013
Multifunctional bowtie-shaped ridge aperture for overlay alignment in plasmonic direct writing lithography using a contact probeSeonghyeon Oh, Taekyong Lee, Jae W Hahn
Scientific Reports|August 31, 2017
Nanoscale 2.5-dimensional surface patterning with plasmonic lithographyHowon Jung, Changhoon Park, Seonghyeon Oh, et al.
Nanotechnology|March 21, 2013
Imaging heterogeneous nanostructures with a plasmonic resonant ridge apertureTaekyong Lee, Eungman Lee, Seonghyeon Oh, et al.
Nanotechnology|December 6, 2017
Optical proximity correction (OPC) in near-field lithography with pixel-based field sectioning time modulationSeonghyeon Oh, Dandan Han, Hyeon Bo Shim, et al.
Pageof 1