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Advanced Materials (Deerfield Beach, Fla.)
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February 7, 2013
Highly improved uniformity in the resistive switching parameters of TiO2 thin films by inserting Ru nanodots
Jung Ho Yoon, Jeong Hwan Han, Ji Sim Jung, et al.
Scientific Reports
|
November 4, 2015
Thickness effect of ultra-thin Ta2O5 resistance switching layer in 28 nm-diameter memory cell
Tae Hyung Park, Seul Ji Song, Hae Jin Kim, et al.
Scientific Reports
|
February 12, 2016
Alternative interpretations for decreasing voltage with increasing charge in ferroelectric capacitors
Seul Ji Song, Yu Jin Kim, Min Hyuk Park, et al.
ACS Applied Materials & Interfaces
|
June 28, 2016
Uniform Self-rectifying Resistive Switching Behavior via Preformed Conducting Paths in a Vertical-type Ta2O5/HfO2-x Structure with a Sub-μm(2) Cell Area
Jung Ho Yoon, Sijung Yoo, Seul Ji Song, et al.
ACS Applied Materials & Interfaces
|
December 13, 2016
Comparison of the Atomic Layer Deposition of Tantalum Oxide Thin Films Using Ta(N<sup>t</sup>Bu)(NEt<sub>2</sub>)<sub>3</sub>, Ta(N<sup>t</sup>Bu)(NEt<sub>2</sub>)<sub>2</sub>Cp, and H<sub>2</sub>O
Seul Ji Song, Taehyung Park, Kyung Jean Yoon, et al.
ACS Applied Materials & Interfaces
|
February 4, 2014
Nanoscale characterization of TiO(2) films grown by atomic layer deposition on RuO(2) electrodes
Katsuhisa Murakami, Mathias Rommel, Boris Hudec, et al.
Nanoscale
|
September 8, 2016
A study of the transition between the non-polar and bipolar resistance switching mechanisms in the TiN/TiO2/Al memory
Xing Long Shao, Kyung Min Kim, Kyung Jean Yoon, et al.
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Search research articles
Search
Showing results (11-20 of 17) with videos related to
Sort By:
Page
of 2
You have reached the last page of results.
This site can display upto 17 results.
Advanced Materials (Deerfield Beach, Fla.)
|
February 7, 2013
Highly improved uniformity in the resistive switching parameters of TiO2 thin films by inserting Ru nanodots
Jung Ho Yoon, Jeong Hwan Han, Ji Sim Jung, et al.
Scientific Reports
|
November 4, 2015
Thickness effect of ultra-thin Ta2O5 resistance switching layer in 28 nm-diameter memory cell
Tae Hyung Park, Seul Ji Song, Hae Jin Kim, et al.
Scientific Reports
|
February 12, 2016
Alternative interpretations for decreasing voltage with increasing charge in ferroelectric capacitors
Seul Ji Song, Yu Jin Kim, Min Hyuk Park, et al.
ACS Applied Materials & Interfaces
|
June 28, 2016
Uniform Self-rectifying Resistive Switching Behavior via Preformed Conducting Paths in a Vertical-type Ta2O5/HfO2-x Structure with a Sub-μm(2) Cell Area
Jung Ho Yoon, Sijung Yoo, Seul Ji Song, et al.
ACS Applied Materials & Interfaces
|
December 13, 2016
Comparison of the Atomic Layer Deposition of Tantalum Oxide Thin Films Using Ta(N<sup>t</sup>Bu)(NEt<sub>2</sub>)<sub>3</sub>, Ta(N<sup>t</sup>Bu)(NEt<sub>2</sub>)<sub>2</sub>Cp, and H<sub>2</sub>O
Seul Ji Song, Taehyung Park, Kyung Jean Yoon, et al.
ACS Applied Materials & Interfaces
|
February 4, 2014
Nanoscale characterization of TiO(2) films grown by atomic layer deposition on RuO(2) electrodes
Katsuhisa Murakami, Mathias Rommel, Boris Hudec, et al.
Nanoscale
|
September 8, 2016
A study of the transition between the non-polar and bipolar resistance switching mechanisms in the TiN/TiO2/Al memory
Xing Long Shao, Kyung Min Kim, Kyung Jean Yoon, et al.
Page
of 2