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Sensors (Basel, Switzerland)|August 26, 2022
Development of a Noninvasive Real-Time Ion Energy Distribution Monitoring System Applicable to Collisional Plasma SheathInho Seong, Sijun Kim, Youngseok Lee, et al.Nanomaterials (Basel, Switzerland)|November 26, 2022
Characterization of an Etch Profile at a Wafer Edge in Capacitively Coupled PlasmaInho Seong, Jinho Lee, Sijun Kim, et al.Materials (Basel, Switzerland)|September 9, 2023
Enhancement of Ar Ion Flux on the Substrate by Heterogeneous Charge Transfer Collision of Ar Atom with He Ion in an Inductively Coupled Ar/He PlasmaInho Seong, Sijun Kim, Minsu Choi, et al.Micromachines|November 11, 2022
Comprehensive Assessments in Bonding Energy of Plasma Assisted Si-SiO2 Direct Wafer Bonding after Low Temperature Rapid Thermal AnnealingYoungseok Lee, Yebin You, Chulhee Cho, et al.Materials (Basel, Switzerland)|May 27, 2023
Contribution of Ion Energy and Flux on High-Aspect Ratio SiO2 Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C4F8 Plasma: Individual Ion Energy and Flux ControlledWonnyoung Jeong, Sijun Kim, Youngseok Lee, et al.Sensors (Basel, Switzerland)|September 9, 2022
Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in PlasmaChulhee Cho, Sijun Kim, Youngseok Lee, et al.Materials (Basel, Switzerland)|August 26, 2023
Characterization of SiO2 Plasma Etching with Perfluorocarbon (C4F8 and C6F6) and Hydrofluorocarbon (CHF3 and C4H2F6) Precursors for the Greenhouse Gas Emissions ReductionMinsu Choi, Youngseok Lee, Yebin You, et al.Journal of the American College of Cardiology|October 23, 2020
Prognostic Utility of Right Ventricular Remodeling Over Conventional Risk Stratification in Patients With COVID-19Jiwon Kim, Alexander Volodarskiy, Razia Sultana, et al.Pageof 2