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Physical Chemistry Chemical Physics : PCCP|August 25, 2018
First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of aluminaGlen N Fomengia, Michael Nolan, Simon D ElliottPhysical Chemistry Chemical Physics : PCCP|May 3, 2012
First principles simulation of reaction steps in the atomic layer deposition of titania: dependence of growth on Lewis acidity of titanocene precursorAleksandra Zydor, Vadim G Kessler, Simon D ElliottACS Applied Materials & Interfaces|April 11, 2018
Understanding the Mechanism of SiC Plasma-Enhanced Chemical Vapor Deposition (PECVD) and Developing Routes toward SiC Atomic Layer Deposition (ALD) with Density Functional TheoryEkaterina A Filatova, Dennis Hausmann, Simon D ElliottNano Letters|July 10, 2008
Chiral shells and achiral cores in CdS quantum dotsSimon D Elliott, Mícheál P Moloney, Yurii K Gun'koACS Applied Materials & Interfaces|June 11, 2014
Effect of reaction mechanism on precursor exposure time in atomic layer deposition of silicon oxide and silicon nitrideCiaran A Murray, Simon D Elliott, Dennis Hausmann, et al.Dalton Transactions (Cambridge, England : 2003)|April 28, 2015
Quantum chemical and solution phase evaluation of metallocenes as reducing agents for the prospective atomic layer deposition of copperGangotri Dey, Jacqueline S Wrench, Dirk J Hagen, et al.Physical Chemistry Chemical Physics : PCCP|October 13, 2025
Finding the temperature window for atomic layer deposition of ruthenium metal <i>via</i> efficient phonon calculationsAlexandr Fonari, Simon D Elliott, Casey N Brock, et al.Advanced Materials (Deerfield Beach, Fla.)|December 23, 2015
Modeling Mechanism and Growth Reactions for New Nanofabrication Processes by Atomic Layer DepositionSimon D Elliott, Gangotri Dey, Yasheng Maimaiti, et al.Inorganic Chemistry|December 10, 2014
Reductive elimination of hypersilyl halides from zinc(II) complexes. Implications for electropositive metal thin film growthChatu T Sirimanne, Marissa M Kerrigan, Philip D Martin, et al.The Journal of Physical Chemistry Letters|January 2, 2016
Role of Surface Termination in Atomic Layer Deposition of Silicon NitrideChaitanya Krishna Ande, Harm C M Knoops, Koen de Peuter, et al.Pageof 2