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Steven M George

Showing results (1-10 of 47) with videos related to

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Accounts of Chemical Research|June 2, 2020
Mechanisms of Thermal Atomic Layer EtchingSteven M George
Chemical Reviews|December 2, 2009
Atomic layer deposition: an overviewSteven M George
ACS Nano|May 25, 2016
Prospects for Thermal Atomic Layer Etching Using Sequential, Self-Limiting Fluorination and Ligand-Exchange ReactionsSteven M George, Younghee Lee
ACS Nano|January 22, 2015
Atomic layer etching of Al2O3 using sequential, self-limiting thermal reactions with Sn(acac)2 and hydrogen fluorideYounghee Lee, Steven M George
The Journal of Chemical Physics|February 10, 2017
Competition between Al<sub>2</sub>O<sub>3</sub> atomic layer etching and AlF<sub>3</sub> atomic layer deposition using sequential exposures of trimethylaluminum and hydrogen fluorideJaime W DuMont, Steven M George
ACS Applied Materials & Interfaces|September 7, 2017
WO<sub>3</sub> and W Thermal Atomic Layer Etching Using "Conversion-Fluorination" and "Oxidation-Conversion-Fluorination" MechanismsNicholas R Johnson, Steven M George
Accounts of Chemical Research|March 3, 2009
Surface chemistry for molecular layer deposition of organic and hybrid organic-inorganic polymersSteven M George, Byunghoon Yoon, Arrelaine A Dameron
ACS Applied Materials & Interfaces|May 13, 2015
Growth and Characterization of Al2O3 Atomic Layer Deposition Films on sp(2)-Graphitic Carbon Substrates Using NO2/Trimethylaluminum PretreatmentMatthias J Young, Charles B Musgrave, Steven M George
Nanotechnology|July 6, 2011
Conformal nanocoating of zirconia nanoparticles by atomic layer deposition in a fluidized bed reactorLuis F Hakim, Steven M George, Alan W Weimer
ACS Applied Materials & Interfaces|September 10, 2014
Growth and properties of hafnicone and HfO(2)/hafnicone nanolaminate and alloy films using molecular layer deposition techniquesByoung H Lee, Virginia R Anderson, Steven M George
Pageof 5

Showing results (1-10 of 47) with videos related to

Sort By:
Pageof 5
Accounts of Chemical Research|June 2, 2020
Mechanisms of Thermal Atomic Layer EtchingSteven M George
Chemical Reviews|December 2, 2009
Atomic layer deposition: an overviewSteven M George
ACS Nano|May 25, 2016
Prospects for Thermal Atomic Layer Etching Using Sequential, Self-Limiting Fluorination and Ligand-Exchange ReactionsSteven M George, Younghee Lee
ACS Nano|January 22, 2015
Atomic layer etching of Al2O3 using sequential, self-limiting thermal reactions with Sn(acac)2 and hydrogen fluorideYounghee Lee, Steven M George
The Journal of Chemical Physics|February 10, 2017
Competition between Al<sub>2</sub>O<sub>3</sub> atomic layer etching and AlF<sub>3</sub> atomic layer deposition using sequential exposures of trimethylaluminum and hydrogen fluorideJaime W DuMont, Steven M George
ACS Applied Materials & Interfaces|September 7, 2017
WO<sub>3</sub> and W Thermal Atomic Layer Etching Using "Conversion-Fluorination" and "Oxidation-Conversion-Fluorination" MechanismsNicholas R Johnson, Steven M George
Accounts of Chemical Research|March 3, 2009
Surface chemistry for molecular layer deposition of organic and hybrid organic-inorganic polymersSteven M George, Byunghoon Yoon, Arrelaine A Dameron
ACS Applied Materials & Interfaces|May 13, 2015
Growth and Characterization of Al2O3 Atomic Layer Deposition Films on sp(2)-Graphitic Carbon Substrates Using NO2/Trimethylaluminum PretreatmentMatthias J Young, Charles B Musgrave, Steven M George
Nanotechnology|July 6, 2011
Conformal nanocoating of zirconia nanoparticles by atomic layer deposition in a fluidized bed reactorLuis F Hakim, Steven M George, Alan W Weimer
ACS Applied Materials & Interfaces|September 10, 2014
Growth and properties of hafnicone and HfO(2)/hafnicone nanolaminate and alloy films using molecular layer deposition techniquesByoung H Lee, Virginia R Anderson, Steven M George
Pageof 5