Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Filters

Tomoharu Ushiyama

Showing results (1-10 of 2) with videos related to

Pageof 1
Sort By:
Inorganic Chemistry|October 23, 2013
Oxygen diffusion and nonstoichiometry in BiFeO3Toshimitsu Ito, Tomoharu Ushiyama, Mitsuko Aoki, et al.
Analytical Sciences : the International Journal of the Japan Society for Analytical Chemistry|February 11, 2010
Evaluation of outermost surface temperature of silicon substrates during UV-excited ozone oxidation at low temperatureNaoto Kameda, Tetsuya Nishiguchi, Yoshiki Morikawa, et al.
Pageof 1

Showing results (1-10 of 2) with videos related to

Sort By:
Pageof 1
Inorganic Chemistry|October 23, 2013
Oxygen diffusion and nonstoichiometry in BiFeO3Toshimitsu Ito, Tomoharu Ushiyama, Mitsuko Aoki, et al.
Analytical Sciences : the International Journal of the Japan Society for Analytical Chemistry|February 11, 2010
Evaluation of outermost surface temperature of silicon substrates during UV-excited ozone oxidation at low temperatureNaoto Kameda, Tetsuya Nishiguchi, Yoshiki Morikawa, et al.
Pageof 1