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Applied Optics|November 21, 2002
Calculation of the average lenslet shape and aberrations of microlens arrays from their far-field intensity distributionAlexander Büttner, Uwe D ZeitnerOptics Express|May 8, 2023
Design of computer-generated holograms based on semi-rigorous simulations of sub-wavelength structuresSebastian Linß, Uwe D ZeitnerOptics Express|April 7, 2017
Rowland ghost suppression in high efficiency spectrometer gratings fabricated by e-beam lithographyMartin Heusinger, Michael Banasch, Uwe D ZeitnerOptics Express|April 6, 2021
Macroscopic wave-optical simulation of dielectric metasurfacesSebastian Linss, Dirk Michaelis, Uwe D ZeitnerOptics Express|April 27, 2022
Ultrafast farfield simulation of non-paraxial computer generated hologramsSebastian Linss, Dirk Michaelis, Uwe D ZeitnerOptics Letters|April 3, 2014
250 nm period grating transferred by proximity i-line mask-aligner lithographyYannick Bourgin, Thomas Käsebier, Uwe D ZeitnerOptics Letters|April 28, 2006
Hybrid optics for focusing ultrashort laser pulsesUlrike Fuchs, Uwe D Zeitner, Andreas TünnermannOptics Express|March 29, 2012
High numerical aperture hybrid optics for two-photon polymerizationFrank Burmeister, Uwe D Zeitner, Stefan Nolte, et al.Optics Letters|February 25, 2014
Pulse compression grating fabrication by diffractive proximity photolithographyLorenz Stuerzebecher, Frank Fuchs, Torsten Harzendorf, et al.Pageof 3