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Magnetic Resonance in Chemistry : MRC|February 5, 2020
Electron spin relaxation time of Ni(II) ion in hexapyrazole zinc(II) dinitrate at 300 KAmrutha K, Velavan Kathirvelu
Magnetic Resonance in Chemistry : MRC|December 3, 2021
Interpretation of EPR and optical spectra of Ni(II) ions in crystalline lattices at ambient temperatureKamalon Amrutha, Velavan Kathirvelu
Spectrochimica Acta. Part A, Molecular and Biomolecular Spectroscopy|October 3, 2012
EPR and optical studies of Nickel(II) at 300 KManochitra Pandi, Ramachitra Somasundaram, Velavan Kathirvelu
Applied Magnetic Resonance|February 4, 2010
Impact of Chlorine Substitution on Spin Lattice Relaxation of Triarylmethyl and 1,4-Benzosemiquinone Radicals in Glass-forming Solvents between 25 and 295 KVelavan Kathirvelu, Gareth R Eaton, Sandra S Eaton
Journal of Magnetic Resonance (San Diego, Calif. : 1997)|February 19, 2009
Electron spin relaxation rates for semiquinones between 25 and 295K in glass-forming solventsVelavan Kathirvelu, Hideo Sato, Sandra S Eaton, et al.
Chemical Communications (Cambridge, England)|May 5, 2011
Calix[4]arene nitroxide tetraradical and octaradicalArnon Olankitwanit, Velavan Kathirvelu, Suchada Rajca, et al.
Journal of the American Chemical Society|November 6, 2009
DEER distance measurement between a spin label and a native FAD semiquinone in electron transfer flavoproteinMichael A Swanson, Velavan Kathirvelu, Tomas Majtan, et al.
Journal of Magnetic Resonance (San Diego, Calif. : 1997)|May 11, 2010
A signal-to-noise standard for pulsed EPRGareth R Eaton, Sandra S Eaton, Richard W Quine, et al.
Protein Science : a Publication of the Protein Society|February 11, 2011
Electron transfer flavoprotein domain II orientation monitored using double electron-electron resonance between an enzymatically reduced, native FAD cofactor, and spin labelsMichael A Swanson, Velavan Kathirvelu, Tomas Majtan, et al.
The Journal of Physical Chemistry. B|February 21, 2008
Impact of electron-electron spin interaction on electron spin relaxation of nitroxide diradicals and tetraradical in glassy solvents between 10 and 300 kHideo Sato, Velavan Kathirvelu, Gaëlle Spagnol, et al.
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