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Journal of Nanoscience and Nanotechnology|November 30, 2011
Fluorination of aluminum oxide gate dielectrics using fluorine neutral/ion beamsByoung Jae Park, Woong Sun Lim, Jae Kwan Yeon, et al.Scientific Reports|June 22, 2017
Vertical and bevel-structured SiC etching techniques incorporating different gas mixture plasmas for various microelectronic applicationsHo-Kun Sung, Tian Qiang, Zhao Yao, et al.Pageof 1