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ACS Applied Materials & Interfaces|October 20, 2021
Fluorescent Labeling to Investigate Nanopatterning Processes in Extreme Ultraviolet LithographyLianjia Wu, Michiel F Hilbers, Olivier Lugier, et al.
Nanoscale|April 1, 2015
High-resolution and large-area nanoparticle arrays using EUV interference lithographyWaiz Karim, Simon Andreas Tschupp, Mehtap Oezaslan, et al.
Nanoscale|May 19, 2020
Universal direct patterning of colloidal quantum dots by (extreme) ultraviolet and electron beam lithographyChristian D Dieleman, Weiyi Ding, Lianjia Wu, et al.
ACS Materials Au|March 1, 2023
Fluorine-Rich Zinc Oxoclusters as Extreme Ultraviolet Photoresists: Chemical Reactions and Lithography PerformanceNeha Thakur, Michaela Vockenhuber, Yasin Ekinci, et al.
ACS Nano|July 13, 2011
High aspect ratio plasmonic nanostructures for sensing applicationsBirgit Päivänranta, Hannes Merbold, Reto Giannini, et al.
Small Methods|June 20, 2023
Theoretical Insights into the Solubility Polarity Switch of Metal-Organic Nanoclusters for Nanoscale PatterningQianqian Wang, Michaela Vockenhuber, Hao Cui, et al.
ACS Applied Materials & Interfaces|December 29, 2022
Sulfonium-Functionalized Polystyrene-Based Nonchemically Amplified Resists Enabling Sub-13 nm NanolithographyZhihao Wang, Jinping Chen, Tianjun Yu, et al.
ACS Nano|December 5, 2022
The Extent of Platinum-Induced Hydrogen Spillover on Cerium DioxideArik Beck, Dimitrios Kazazis, Yasin Ekinci, et al.
ACS Nano|February 18, 2011
Nanofabrication of broad-band antireflective surfaces using self-assembly of block copolymersBirgit Päivänranta, Pratap K Sahoo, Elizabeth Tocce, et al.
ACS Nano|August 20, 2024
Approaching Angstrom-Scale Resolution in Lithography Using Low-Molecular-Mass Resists (<500 Da)Mohammad S M Saifullah, Anil Kumar Rajak, Kevin A Hofhuis, et al.
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